A study of the performance of etching silicon using SF6/O2-based chemistry with cryogenical wafer cooling and a high density ICP source

Henricus V. Jansen (Invited speaker)

    Activity: Talk or presentationOral presentation

    Description

    Opmerking: Invited
    Period3 Sep 1999
    Held atHahn-Schickard-Gesellschaft für angewandte Forschung e.V., Institut für Mikro- und Informationstechnik (HSG-IMIT), Germany
    Degree of RecognitionInternational

    Keywords

    • METIS-116535