A study of the performance of etching silicon using SF6/O2-based chemistry with cryogenical wafer cooling and a high density ICP source

  • Henricus V. Jansen (Invited speaker)

    Activity: Talk or presentationOral presentation


    Opmerking: Invited
    Period3 Sept 1999
    Held atHahn-Schickard-Gesellschaft für angewandte Forschung e.V., Institut für Mikro- und Informationstechnik (HSG-IMIT), Germany
    Degree of RecognitionInternational


    • METIS-116535