Adaptive multilayer mirrors based on piezoelectric actuators for XUV lithography

Nematollahi, M. (Speaker), Lucke, P. (Contributor), Bayraktar, M. (Contributor), Kerstin Hild (Contributor), Toralf Gruner (Contributor), Yakshin, A. (Contributor), Rijnders, A. J. H. M. (Contributor), Louis, E. (Contributor), Bijkerk, F. (Contributor)

Activity: Talk or presentationOral presentation

Period12 Dec 2018
Held at13th International MicroNanoConference 2018
Event typeConference
Conference number13
LocationAmsterdam, Netherlands
Degree of RecognitionInternational

Keywords

  • Adaptive Optics
  • EUV lithography
  • Deformable multilayer mirror
  • PZT