Keywords
- METIS-292983
Advantages of UV based nanolmprint Lithography and dual-source dry etching for novel applications
- R. van der Meer (Speaker)
- S. Büyükköse (Speaker)
- B. Krishnan (Speaker)
- I.V. Kozhevnikov (Speaker)
- Meint J. de Boer (Speaker)
- B. Vratzov (Speaker)
- Bastiaens, H. M. J. (Speaker)
- Huskens, J. (Speaker)
- G.P.M. Roelofs (Speaker)
- P.V. Santos (Speaker)
- van der Wiel, W. G. (Speaker)
- P.E. Hegeman (Speaker)
- G.C.S. Brons (Speaker)
- Boller, K. J. (Speaker)
- Bijkerk, F. (Speaker)
Activity: Talk or presentation › Oral presentation