Advantages of UV based nanolmprint Lithography and dual-source dry etching for novel applications

R. van der Meer (Speaker), S. Büyükköse (Speaker), B. Krishnan (Speaker), I.V. Kozhevnikov (Speaker), Meint J. de Boer (Speaker), B. Vratzov (Speaker), Bastiaens, H. M. J. (Speaker), Huskens, J. (Speaker), G.P.M. Roelofs (Speaker), P.V. Santos (Speaker), van der Wiel, W. G. (Speaker), P.E. Hegeman (Speaker), G.C.S. Brons (Speaker), Boller, K. J. (Speaker), Bijkerk, F. (Speaker)

Activity: Talk or presentationOral presentation

Period10 Dec 2012
Held atNetherlands MicroNanoConference 2012
Event typeConference
LocationEde/Wageningen, Netherlands
Degree of RecognitionNational

Keywords

  • METIS-292983