Advantages of UV based nanolmprint Lithography and dual-source dry etching for novel applications

  • R. van der Meer (Speaker)
  • S. Büyükköse (Speaker)
  • B. Krishnan (Speaker)
  • I.V. Kozhevnikov (Speaker)
  • Meint J. de Boer (Speaker)
  • B. Vratzov (Speaker)
  • Hubertus M.J. Bastiaens (Speaker)
  • Huskens, J. (Speaker)
  • G.P.M. Roelofs (Speaker)
  • P.V. Santos (Speaker)
  • van der Wiel, W. G. (Speaker)
  • P.E. Hegeman (Speaker)
  • G.C.S. Brons (Speaker)
  • Boller, K. J. (Speaker)
  • Bijkerk, F. (Speaker)

Activity: Talk or presentationOral presentation

Period10 Dec 2012
Event titleNetherlands MicroNanoConference 2012
Event typeConference
LocationEde/Wageningen, NetherlandsShow on map
Degree of RecognitionNational

Keywords

  • METIS-292983