Advantages of UV-NanoImprint Lithography and dual-source dry etching for novel applications

R. van der Meer (Speaker), B. Krishnan (Speaker), I.V. Kozhevnikov (Speaker), M.J. de Boer (Speaker), B. Vratzov (Speaker), Bastiaens, H. M. J. (Speaker), Huskens, J. (Speaker), G.P.M. Roelofs (Speaker), P.V. Santos (Speaker), van der Wiel, W. G. (Speaker), P.E. Hegeman (Speaker), C. Brons (Speaker), Boller, K. (Speaker), Bijkerk, F. (Speaker)

Activity: Talk or presentationOral presentation

Period10 Dec 2012
Event titleNetherlands MicroNanoConference 2012
Event typeConference
LocationEde/Wageningen, Netherlands
Degree of RecognitionInternational