Advantages of UV-NanoImprint Lithography and dual-source dry etching for novel applications

R. van der Meer (Speaker), B. Krishnan (Speaker), I.V. Kozhevnikov (Speaker), M.J. de Boer (Speaker), B. Vratzov (Speaker), Bastiaens, H. M. J. (Speaker), Huskens, J. (Speaker), G.P.M. Roelofs (Speaker), P.V. Santos (Speaker), van der Wiel, W. G. (Speaker), P.E. Hegeman (Speaker), C. Brons (Speaker), Boller, K. (Speaker), Bijkerk, F. (Speaker)