Collector mirror design to separate the stray 10.6 μm CO2 laser light from the EUV light at the intermediate focus,

Activity: Talk or presentationOral presentation


Plaats van uitgifte: Toyama, Japan
Period6 Oct 2013
Event title2013 International Symposium on Extreme Ultraviolet Lithography
Event typeConference
LocationToyama, JapanShow on map


  • METIS-298547