Damage processes in ruthenium thin films induced by XUV and x-ray free electron lasers

Milov, I. (Speaker), Makhotkin, I. A. (Contributor), Jaromir Chalupský (Contributor), Kai Tiedtke (Contributor), Frank Scholze (Contributor), F. Sievert (Contributor), Nikita Medvedev (Contributor), vladimir lipp (Contributor), V. Zhakhovsky (Contributor), N. Inogamov (Contributor), Hartmut Enkisch (Contributor), Gosse de Vries (Contributor), Ryszard Sobierajski (Contributor)

Activity: Talk or presentationInvited talk

Description

Survivability of optical elements exposed to high doses of laser radiation is an important issue in the context of rapidly developing x-ray free-electron laser (XFEL) light sources. In order to prevent optics from being damaged the fundamental mechanisms governing the material response to ultrashort high peak power XFEL pulses must be identified and examined.
Period22 Nov 2018