EUVL optics for Free Electron Laser sources: damage threshold studies and the use of adjusted wavelengths

Louis, E. (Speaker), Zameshin, A. (Contributor), Yakshin, A. (Contributor), Makhotkin, I. A. (Contributor), Bijkerk, F. (Contributor)

Activity: Talk or presentationOral presentation

Period7 Nov 2017
Degree of RecognitionInternational