Irradiation of EUV-mirrors with multiple FEL pulses below the single shot damage threshold

  • Makhotkin, I. A. (Invited speaker)
  • H. Enkisch (Contributor)
  • R. Sobierajski (Contributor)
  • Jaromir Chalupsky (Contributor)
  • K. Tiedtke (Contributor)
  • Gosse de Vries (Contributor)
  • M. Störmer (Contributor)
  • F. Scholze (Contributor)
  • F. Siewert (Contributor)
  • van de Kruijs, R. W. E. (Contributor)
  • Igor Milov (Contributor)
  • Louis, E. (Contributor)
  • I. Yatsyna (Contributor)
  • M. Jurek (Contributor)
  • L. Juha (Contributor)
  • V. Hájková (Contributor)
  • V. Vozda (Contributor)
  • T. Burian (Contributor)
  • K. Saksl (Contributor)
  • B. Faatz (Contributor)
  • B. Keitel (Contributor)
  • E. Ploenjes (Contributor)
  • S. Schreiber (Contributor)
  • S. Toleikis (Contributor)
  • R.A. Loch (Contributor)
  • M. Hermann (Contributor)
  • S. Strobel (Contributor)
  • H. Nienhuys (Contributor)

Activity: Talk or presentationInvited talk


A free-electron laser (FEL) is an intense sources of near monochromatic light. The FEL principle is mentioned as source for lithography. As FEL output comes in ultra-short pulses, optics and coatings are needed that withstand short, and intense light pulses.
Period24 Apr 201727 Apr 2017
Event titleSPIE Optics + Optoelectronics 2017
Event typeConference
OrganiserSPIE - The International Society for Optical Engineering
LocationPrague, Czech RepublicShow on map
Degree of RecognitionInternational