Irradiation of EUV-mirrors with multiple FEL pulses below the single shot damage threshold

Makhotkin, I. A. (Invited speaker), H. Enkisch (Contributor), R. Sobierajski (Contributor), Jaromir Chalupsky (Contributor), K. Tiedtke (Contributor), Gosse de Vries (Contributor), M. Störmer (Contributor), F. Scholze (Contributor), F. Siewert (Contributor), van de Kruijs, R. W. E. (Contributor), Milov, I. (Contributor), Louis, E. (Contributor), I. Yatsyna (Contributor), M. Jurek (Contributor), L. Juha (Contributor), V. Hájková (Contributor), V. Vozda (Contributor), T. Burian (Contributor), K. Saksl (Contributor), B. Faatz (Contributor), B. Keitel (Contributor), E. Ploenjes (Contributor), S. Schreiber (Contributor), S. Toleikis (Contributor), R.A. Loch (Contributor), M. Hermann (Contributor), S. Strobel (Contributor), H. Nienhuys (Contributor)

Activity: Talk or presentationInvited talk

Description

A free-electron laser (FEL) is an intense sources of near monochromatic light. The FEL principle is mentioned as source for lithography. As FEL output comes in ultra-short pulses, optics and coatings are needed that withstand short, and intense light pulses.
Period24 Apr 2017 - 27 Apr 2017
Held atSPIE Optics + Optoelectronics 2017
Event typeConference
LocationPrague, Czech Republic
Degree of RecognitionInternational