Lithography machine in-line broadband spectrum metrology and feedback control system

  • Fei Liu (Speaker)
  • Dries Smeets (Contributor)
  • Sjoerd Huang (Contributor)
  • Andrei Yakunin (Contributor)
  • Peter Havermans (Contributor)
  • Rene Oesterholt (Contributor)
  • Bayraktar, M. (Contributor)
  • Bijkerk, F. (Contributor)

Activity: Talk or presentationOral presentation

Period10 Jun 201913 Jun 2019
Event title2019 EUVL Workshop
Event typeConference
LocationBerkeley, United States, California
Degree of RecognitionInternational