On the deposition kinetics of the LPCVD gate oxides prepared from SiH4 and O2

J.B. Rem (Invited speaker), J.H. Klootwijk (Invited speaker), C. Cobianu (Invited speaker), J. Holleman (Invited speaker), J.F. Verweij (Invited speaker)

    Activity: Talk or presentationOral presentation

    Description

    Opmerking: Invited Plaats van uitgifte: Venetie
    Period10 Sep 1995
    Event titleVoordracht EUROCVD
    Event typeConference
    LocationVenetie

    Keywords

    • METIS-116844