Rapid thermal annealing of low-energy P and B implants in silicon, optimized by high resolution X-ray diffraction

J.G.E. Klappe (Keynote speaker), I. Barsony (Keynote speaker), P.H. Woerlee (Keynote speaker), T.W. Ryan (Keynote speaker), P. Alkemade (Keynote speaker)

    Activity: Talk or presentationOral presentation


    Opmerking: Key-note speaker Plaats van uitgifte: San Fransisco, CA, USA
    Period4 Apr 1994
    Event titleMRS Spring Meeting 1994, Technical Symposium G-Rapid Thermal and Integrated Processing III
    Event typeConference
    LocationSan Fransisco, United States, California


    • METIS-116289