Resistless sub-100nm patterning by evaporation through microfabricated and focussed-ion-beam processed nanostencils

J.P. Brugger (Invited speaker)

    Activity: Talk or presentationOral presentation

    Description

    Opmerking: Invited Plaats van uitgifte: UT, Enschede, Nederland
    Period26 May 2000
    Event titleNEVAC-dag 2000
    Event typeSeminar
    LocationEnschede, Netherlands

    Keywords

    • METIS-116334