Self-Assembly of PFS-b-PMMA Block Copolymers in a Selective Solvent

Igor Korczagin (Speaker), Remco G. Fokkink (Speaker), Martien A. Cohen Stuart (Speaker), Mahmoud Al-Hussein (Speaker), Paul H.H. Bomans (Speaker), Peter M. Frederik (Speaker), Vancso, G. J. (Speaker)

Activity: Talk or presentationOral presentation

Description

Recently we described the synthesis of a novel organic-organometallic block copolymer, poly (ferrocenylsilane-b-methyl methacrylate)(Figure 1) using sequential anionic polymerization and atom transfer radical polymerization (ATRP). 1 By combining functional organometallic blocks with taylored organic blocks, new nanoscale, self-assembled systems for lithographic, catalytic and other applications may be accessed. Poly (ferrocenylsilane) s, PFS, 2 show a remarkable resistance towards dry etching with eg oxygen, CF4 and SF6 .
Period28 Mar 2006
Event title231th ACS National Meeting 2006: Spring 2006
Event typeConference
Conference number231
LocationAtlanta, United States
Degree of RecognitionInternational

Keywords

  • METIS-232454