Self-Assembly of PFS-b-PMMA Block Copolymers in a Selective Solvent

Igor Korczagin (Speaker)
Remco G. Fokkink (Speaker)
Martien A. Cohen Stuart (Speaker)
Mahmoud Al-Hussein (Speaker)
Paul H.H. Bomans (Speaker)
Peter M. Frederik (Speaker)
Vancso, G. J. (Speaker)

Materials Science and Technology of Polymers

Activity: Talk or presentation › Oral presentation

Description

Recently we described the synthesis of a novel organic-organometallic block copolymer, poly (ferrocenylsilane-b-methyl methacrylate)(Figure 1) using sequential anionic polymerization and atom transfer radical polymerization (ATRP). 1 By combining functional organometallic blocks with taylored organic blocks, new nanoscale, self-assembled systems for lithographic, catalytic and other applications may be accessed. Poly (ferrocenylsilane) s, PFS, 2 show a remarkable resistance towards dry etching with eg oxygen, CF4 and SF6 .

Period	28 Mar 2006
Event title	231th ACS National Meeting 2006: Spring 2006
Event type	Conference
Conference number	231
Organiser	American Chemical Society
Location	Atlanta, United StatesShow on map
Degree of Recognition	International

Keywords

METIS-232454