Tertiary etching of W/Si multilayer mirrors for the fabrication of lamellar multilayer gratings

R. van der Meer (Speaker), B. Krishnan (Speaker), I.V. Kozhevnikov (Speaker), M.J. de Boer (Speaker), B. Vratzov (Speaker), Bastiaens, H. M. J. (Speaker), Huskens, J. (Speaker), van der Wiel, W. G. (Speaker), P.E. Hegeman (Speaker), Boller, K. (Speaker), Bijkerk, F. (Speaker)