The production of metal organic chemical vapour deposited (MOCVD) thin alumina films against high temperature corrosion

V.A.C. Haanappel (Speaker), H.D. van Corbach (Speaker), T. Fransen (Speaker), P.J. Gellings (Speaker)

Activity: Talk or presentationOral presentation

Description

Plaats van uitgifte: Honolulu, Hawaii
Period16 May 1993

Keywords

  • METIS-110574