The production of metal organic chemical vapour deposited (MOCVD) thin alumina films against high temperature corrosion

  • V.A.C. Haanappel (Speaker)
  • van Corbach, H. D. (Speaker)
  • T. Fransen (Speaker)
  • P.J. Gellings (Speaker)

Activity: Talk or presentationOral presentation

Description

Plaats van uitgifte: Honolulu, Hawaii
Period16 May 1993
Event title183rd Meeting of The Electrochemical Society Inc.
Event typeConference
LocationHonolulu, HawaiiShow on map

Keywords

  • METIS-110574