Thermal Scanning Probe Lithography; A Highly Localized Spatially Controlled Approach for Sub 50 nm Thermal Chemical Lithography

Duvigneau, J. (Speaker), Holger Schönherr (Speaker), Vancso, G. J. (Speaker)

Activity: Talk or presentationOral presentation

Description

Plaats van uitgifte: Veldhoven, The Netherlands
Period15 Feb 2010
Event titleDutch Polymer Days, DPD 2010: null
Event typeConference
LocationVeldhoven, Netherlands

Keywords

  • METIS-272716