Towards AFM-Based Nanoscale Chemical Lithography

Holger Schönherr (Speaker), C.L. Feng (Speaker), A. Shovsky (Speaker), Duvigneau, J. (Speaker)

Activity: Talk or presentationOral presentation

Description

Plaats van uitgifte: Groningen
Period9 Dec 2005
Event titleNanoNed/MicroNed Symposium I 2005
Event typeConference
Conference number1
LocationGroningen, Netherlands

Keywords

  • METIS-230156