Wavelength selection for multilayer coatings for the lithography generation beyond EUVL

Activity: Talk or presentationOral presentation

Period12 Feb 2012
Event titleSPIE Conference on Extreme Ultraviolet (EUV) Lithography III, 2012
Event typeConference
Conference number3
OrganiserSPIE - The International Society for Optical Engineering
LocationSan Jose, United States, CaliforniaShow on map

Keywords

  • METIS-288363