Wavelength selection for multilayer coatings for the lithography generation beyond EUVL

Makhotkin, I. A. (Speaker), E. Zoethout (Speaker), Louis, E. (Speaker), A.M. Yakunin (Speaker), S. Muellender (Speaker), Bijkerk, F. (Speaker)

Activity: Talk or presentationOral presentation

Period12 Feb 2012
Event titleSPIE Conference on Extreme Ultraviolet (EUV) Lithography III, 2012
Event typeConference
Conference number3
LocationSan Jose, United States, California

Keywords

  • METIS-288363