Wavelength selection for multilayer coatings for the lithography generation beyond EUVL

  • Igor Alexandrovich Makhotkin (Speaker)
  • E. Zoethout (Speaker)
  • Louis, E. (Speaker)
  • A.M. Yakunin (Speaker)
  • S. Muellender (Speaker)
  • Bijkerk, F. (Speaker)

Activity: Talk or presentation › Oral presentation

Period12 Feb 2012
Event titleSPIE Conference on Extreme Ultraviolet (EUV) Lithography III, 2012
Event typeConference
Conference number3
OrganiserSPIE - The International Society for Optical Engineering
LocationSan Jose, United States, CaliforniaShow on map

Keywords

  • METIS-288363

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