Research Output 1971 2019

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2011

B4C/Si based EUV multilayer mirror with suppressed reflectivity for CO2 laser radiation

Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Yakunin, S. N. & Bijkerk, F., 2011, Maui, Hawaii, US

Research output: Other contributionOther research output

Comparative damage studies in multilayer optics induced by intense short-wavelength pulses from FLASH and LCLS

Loch, R. A., Sobierajski, R., Bostedt, C., Bozek, J., Bruijn, S., Burian, T., Chalupsky, J., Feng, Y., Gaudin, J., Graf, A., van Hattum, E. D., Hau-Riege, S., Juha, L., Khorsand, A. R., Klinger, D., van de Kruijs, R. W. E., Krzywinski, J., London, R., Louis, E., Messerschmidt, M. & 4 othersMoeller, S., Schlotter, W., Tiedtke, K. & Bijkerk, F., 2011, Hamburg

Research output: Other contributionOther research output

Damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs

Louis, E., Sobierajski, R., Loch, R. A., Bostedt, C., Bozek, J., Burian, T., Chalupsky, J., Gaudin, J., Graf, A., Grzonka, J., Hajkova, V., Hau-Riege, S. P., van Hattum, E. D., Juha, L., Klinger, D., Krzywinski, J., London, R., Messerschmidt, M., Moeller, S., Plocinski, T. & 3 othersWawro, A., Zabierowski, P. & Bijkerk, F., 2011, Prague

Research output: Other contributionOther research output

optics
damage
free electron lasers
wavelengths
optical coatings

Depth profiling of Mo/Si multilayers: the effect of Ar-ion energy on layer structure

Zoethout, E., Louis, E. & Bijkerk, F., 2011, Paris, Fr

Research output: Other contributionOther research output

erosion
Bragg reflectors
ions
Auger spectroscopy
molybdenum

Determination of the density of ultrathin films using X-ray standing waves

Makhotkin, I. A., 2011, Veldhoven, Netherlands

Research output: Other contributionOther research output

standing waves
grazing incidence
x rays
reflectance
markers

Developing reflective multilayer coatings, an enabling component of Extreme Ultraviolet Lithography and beyond

Louis, E., Muellender, S. & Bijkerk, F., 2011, Miami, Florida

Research output: Other contributionOther research output

lithography
coatings
wavelengths
reflectance
light sources

EUV multilayer mirror with suppressed reflectivity for CO2 laser radiation

Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Yakunin, S. N. & Bijkerk, F., 2011, Miami, Florida

Research output: Other contributionOther research output

laser beams
mirrors
reflectance
extreme ultraviolet radiation
infrared radiation

Fiber-based ellipsometry for in situ monitoring

Liu, F., Lee, C. J., Chen, J., Louis, E. & Bijkerk, F., 2011, Baltimore, US

Research output: Other contributionOther research output

preserving
line of sight
ellipsometry
fibers
polarization

Multilayer based solutions for suppression of IR radiation in EUV systems

Medvedev, V., van den Boogaard, T., van de Kruijs, R. W. E., Yakshin, A., Louis, E., Krivtsun, V. M., Yakunin, S. N. & Bijkerk, F., 2011, Veldhoven

Research output: Other contributionOther research output

retarding
reflectance
radiation
mirrors
specular reflection

Multilayer development for Extreme Ultraviolet and shorter wavelength lithography

Louis, E., Muellender, S. & Bijkerk, F., 2011, Dublin, Ireland

Research output: Other contributionOther research output

lithography
optics
wavelengths
smoothing
specifications

Multilayer Extreme UV Optics

Bijkerk, F., 2011, Ede, Netherlands

Research output: Other contributionOther research output

optics
photolithography
physics
Bragg reflectors
thin films

Multilayer Extreme UV Optics

Bijkerk, F., 2011, Amsterdam

Research output: Other contributionOther research output

optics
physics
Bragg reflectors
photolithography
radiation damage

Multilayer Extreme UV Optics, or how science can benefit from its application

Bijkerk, F., 2011, Veldhoven, Netherlands

Research output: Other contributionOther research output

optics
physics
Bragg reflectors
photolithography
radiation damage

Multilayers for the lithography generation beyond EUVL

Makhotkin, I. A., Zoethout, E., Louis, E., Yakunin, A. M. & Bijkerk, F., 2011, Veldhoven

Research output: Other contributionOther research output

lithography
reflectance
interlayers
wavelengths
ions

Negating HIO-induced metal and carbide EUV surface contamination

Sturm, J. M., Gleeson, M., van de Kruijs, R. W. E., Lee, C. J., Kleyn, A. W. & Bijkerk, F., 2011

Research output: Other contributionOther research output

photolithography
ultraviolet radiation
carbides
contamination
projection

Nitrogen Passivation in La/B4C Layered Structures

Makhotkin, I. A., Zoethout, E., Louis, E. & Bijkerk, F., 2011, Bulgaria

Research output: Other contributionOther research output

passivity
nitrogen
nitrides
mirrors
binding energy

Non-constant diffusion rate in sub nanometer thick Mo-Si interlayers

Bosgra, J., Yakshin, A. & Bijkerk, F., 2011, Dijon, France

Research output: Other contributionOther research output

tuning
mirrors
reflectance
wavelengths
incidence

Reflective multilayer coatings, an enabling component of Extreme Ultraviolet Lithography and beyond

Louis, E., Muellender, S. & Bijkerk, F., 2011, Maui, Hawaii

Research output: Other contributionOther research output

lithography
optics
coatings
Bragg reflectors
acceleration (physics)

Structural properties of sub nanometer thick layers to enhance EUV multilayer mirror reflectance

Bosgra, J., van de Kruijs, R. W. E., Zoethout, E., Verhoeven, J., Yakshin, A. & Bijkerk, F., 2011, Veldhoven, Netherlands

Research output: Other contributionOther research output

transition metals
mirrors
reflectance
interlayers
laminates

Thermal damage in Mo/Si based multilayers for short-wavelength FELs

Yakshin, A., Van de Kruis, R. W. E., Sobierajski, R., Louis, E., Bruijn, S., Loch, R. A. & Bijkerk, F., 2011, Kyoto, Japan

Research output: Other contributionOther research output

Understanding solid state diffusion in multilayered structures on a picometer lengthscale

van de Kruijs, R. W. E., Bruijn, S. & de Rooij-Lohmann, V. I. T. A., 2011, Veldhoven, Netherlands

Research output: Other contributionOther research output

solid state
x ray diffraction
mirrors
activation energy
annealing

Wavelength selection for multilayer coatings for the lithography generation beyond EUVL

Makhotkin, I. A., Zoethout, E., Louis, E., Muellender, S. & Bijkerk, F., 2011, Miami, Florida (US)

Research output: Other contributionOther research output

2008

Laser Physics & Non-Linear Optics

Boller, K. J. & Bijkerk, F., 16 Jun 2008, Enschede

Research output: Other contributionOther research output

2006

Fotokristallen

Peters, P. J. M., 11 May 2006, Enschede

Research output: Other contributionOther research output

2002

Phase locking dynamics of a degenerate optical parametric oscillator

Gross, P., Klein, M. E., Lee, D. H. & Boller, K. J., 14 Nov 2002, Lunteren

Research output: Other contributionOther research output

2000

Design of a Double Focusing Beam Transport System for the 25 MeV Electron Beam

Volokhine, I., Verschuur, J. W. J., de Wit, F. F., Ernst, G. J., Botman, J. I. M. & Boller, K. J., 13 Aug 2000, Durham, North Carolina, USA

Research output: Other contributionOther research output

Design of a double focusing transport system for 25 MeV electron beam

Volokhine, I., Verschuur, J. W. J., de Wit, F. F., Ernst, G. J. & Botman, J. I. M., 28 Mar 2000, Lunteren

Research output: Other contributionOther research output

European Thematic Network Project for an Industrial Free-Electron Maser at 10-100 GHz

Al-shamma'a, A. I., Stuart, R. A., Lucas, J. & van der Slot, P. J. M., 13 Aug 2000, Durham, NC, USA

Research output: Other contributionOther research output

Influence of the resonance radiation losses on the characteristics of a DC discharge in Ar-He-Xe gas mixtures

van der Poel, G., Starostin, S. A., Kochetov, I. V., Blok, F. J., Peters, P. J. M., Udalov, Y. B. & Witteman, W. J., 28 Mar 2000, Lunteren

Research output: Other contributionOther research output

RF discharges for laser excitation theory and experiment

Starostin, S. A., van der Poel, G., Peters, P. J. M., Udalov, Y. B., Witteman, W. J., Kochetov, I. V. & Napartovich, A. P., 28 Mar 2000, Lunteren

Research output: Other contributionOther research output

Zero slippage operation of TEUFEL

Verschuur, J. W. J., Ernst, G. J., Botman, J. I. M. & Boller, K. J., 13 Aug 2000, Durham, North Carolina, USA

Research output: Other contributionOther research output

1998

A conduction cooled, 68 cm long, warm bore, 3 T Nb3Sn solenoid for a Cerenkov free electron laser

Wessel, W. A. J., den Ouden, A., Krooshoop, H. J. G., ten Kate, H. H. J., Wieland, J. & van der Slot, P. J. M., 14 Oct 1998, Palm Desert, California, USA

Research output: Other contributionOther research output

Beam pointing stability studies on a long pulse XeCl excimer laser fitted with unstable resonators

Hofstra, R. M., Zwegers, M. J., van Goor, F. A. & Witteman, W. J., 17 Mar 1998, Lunteren

Research output: Other contributionOther research output

Comapact beam transport system for injection of 6 MeV electron beam in race-track-microtron accelerator

Verschuur, J. W. J., Analbers, R., Ernst, G. J. & Witteman, W. J., 17 Apr 1998, Delft

Research output: Other contributionOther research output

Long pulse operation of a x-ray preionised F2 and ArF laser excited by a prepulse-main pulse system with magnetic switch

Bastiaens, H. M. J., Peeters, S. J. M., Renard, S., Peters, P. J. M. & Witteman, W. J., 17 Mar 1998, Lunteren

Research output: Other contributionOther research output

Research and development of long pulse excimer lasers

Feenstra, L., Bastiaens, H. M. J., van Goor, F. A., Hofstra, R. M., Peters, P. J. M., Timmermans, J. C. M., Zwegers, M. J. & Witteman, W. J., 17 Mar 1998, Lunteren

Research output: Other contributionOther research output

Resonator design for a long pulse XeCl excimer laser

Hofstra, R. M., Zwegers, M. J., van Goor, F. A. & Witteman, W. J., 17 Mar 1998, Lunteren

Research output: Other contributionOther research output

Short pulse genereation by a XeCl excimer laser

Zwegers, M. J., Hofstra, R. M., van Goor, F. A. & Witteman, W. J., 17 Mar 1998, Lunteren

Research output: Other contributionOther research output

1997

A Cryocooler Cooled 68 cm Long Warm Bore 3 T Nb3Sn Solenoid for a Cerenkov Free Electron Laser

den Ouden, A., Wessel, W. A. J., ten Kate, H. H. J. & van der Slot, P. J. M., 25 Oct 1997, Beijing, China

Research output: Other contributionOther research output

An x-ray preionised discharge pumped ArF-laser

Feenstra, L., Hoekstra, O. B., Peters, P. J. M. & Witteman, W. J., 5 Nov 1997, Lunteren

Research output: Other contributionOther research output

Beam divergency studies on a long pulse XeCl excimer laser

Hofstra, R. M., van Goor, F. A. & Witteman, W. J., 1 Jul 1997, Smolenice

Research output: Other contributionOther research output

Beam pointing stability studies on a long pulse XeCl excimer laser fitted with unstable resonators

Hofstra, R. M., Zwegers, M. J., van Goor, F. A. & Witteman, W. J., 5 Nov 1997, Lunteren

Research output: Other contributionOther research output

Beam pointing stability studies on a long pulse XeCl excimer laser fitted with unstable resonators

Hofstra, R. M., Zwegers, M. J., van Goor, F. A. & Witteman, W. J., 26 Nov 1997, Eindhoven

Research output: Other contributionOther research output

Een lange puls moleculaire fluor laser

Peeters, S. J. M., Bastiaens, H. M. J., Peters, P. J. M. & Witteman, W. J., 11 Mar 1997, Lunteren

Research output: Other contributionOther research output

On the use of photo cathode linacs for Free Electron Lasers

Verschuur, J. W. J., van Oerle, B. M., Ernst, G. J., Bisero, D. & Witteman, W. J., 26 Aug 1997, Eindhoven

Research output: Other contributionOther research output

Optical Pulse duration measurements at 250 micrometer with the FIR streak camera

Verschuur, J. W. J., Witteman, W. J., Noordam, L. D., Drabbels, M., Rella, C. & van Oerle, B. M., 18 Aug 1997, Beijing

Research output: Other contributionOther research output

Resonator design for a long pulse XeCl excimer laser

Hofstra, R. M., Zwegers, M. J., van Goor, F. A. & Witteman, W. J., 5 Nov 1997, Lunteren

Research output: Other contributionOther research output