Research Output 1971 2019

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Patent
2012
10 Downloads (Pure)

Spectral filter for splitting a beam with electromagnetic radiation having wavelengths in the extreme ultraviolet (EUV) or soft X-Ray (Soft X) and the infrared (IR) wavelength range

van Goor, F. A., Bijkerk, F., van den Boogaard, T. & van der Meer, R., 23 Feb 2012, (Submitted) Patent No. WO 2012/023853 A1, Priority date 23 Feb 2012

Research output: PatentProfessional

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electromagnetic radiation
filters
extreme ultraviolet radiation
wavelengths
grooves
2011
6 Downloads (Pure)

Method for manufacturing a multilayer structure with a lateral pattern for application in the XUV wavelength range, and BF and LMAG structures manufactured according to this method

Bijkerk, F., van der Wiel, W. G., van der Meer, R. & Hegeman, P. E., 16 Jun 2011, (Submitted) Patent No. WO 2011/071380 A1, Priority date 16 Jun 2011

Research output: PatentProfessional

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REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME

Tsarfati, T., Zoethout, E., Louis, E. & Bijkerk, F., 11 Aug 2011, IPC No. H05H 1/ 24 A I, Patent No. US2011194087, Priority date 7 Jan 2011, Priority No. US20110986856

Research output: PatentProfessional

manufacturing
refractivity
wavelengths
thorium
lanthanum

Verfahren zur Herstellung eines reflektiven optischen Elements für die EUV-Lithographie

Kuznetsov, A., Gleeson, M., van de Kruijs, R. W. E. & Bijkerk, F., 2011, (In preparation) Patent No. DE 10 2011 077 983A1, Priority date 27 Apr 2011

Research output: PatentProfessional

2010

Method for manufacturing a multilayer structure with a lateral pattern for application in the XUV wavelength range, and BF and LMAG structures manufactured according to this method

Bijkerk, F., van der Wiel, W. G., van der Meer, R. & Hegeman, P. E., 2010, (Submitted) Patent No. 10769182.3, Priority No. NL20092003950 20091211, WO2010NL50832 20101208

Research output: PatentProfessional

Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby

Koshelev, K. N., Bijkerk, F., Zukavishvili, G. G., Korop, E. D. & Ivanov, V. V., 2010, (In preparation) Patent No. US20060600340 20061116, Priority date 3 Jul 2000, Priority No. EP20000202304 20000703, US20060600340 20061116

Research output: PatentProfessional

Reflective element for EUV lithography device

Yakshin, A., van de Kruijs, R. W. E., Bijkerk, F., Louis, E. & Nedelcu, I., 2010, (Submitted) Patent No. US20090536251 20090805, Priority date 5 Aug 2009

Research output: PatentProfessional

Reflektives optisches Element und Verfahren zu seiner Herstellung/ Method to enhance layer contrast of a multilayer for reflection at the B absorption edge

Tsarfati, T., Zoethout, E., Louis, E. & Bijkerk, F., 2010, (Submitted) Patent No. # US 61/079307 (US); # DE102008040265 (Germany), Priority date 30 May 2009

Research output: PatentProfessional

2007

Method and system for creating a homogeneous pulsed gas discharge

Peters, P. J. M., Mathew, D., Bastiaens, H. M. J. & Boller, K. J., 25 Apr 2007, (In preparation) Patent No. 07106948.8, Priority date 25 Apr 2007

Research output: PatentProfessional

2004

Method for coating substrates and mask holder

Bijkerk, F., Yakshin, A., Louis, E., Kessels, M. J. H., Maas, E. L. G. & Bruineman, C., 18 Mar 2004, IPC No. C23C 16/ 04 A I, Patent No. US2004052942, Priority date 14 Dec 2001, Priority No. WO2001EP14728

Research output: PatentProfessional

holders
coating
masks
hinges
apertures
2002

MULTI-LAYER MIRROR FOR RADIATION IN THE XUV WAVELENGHT RANGE AND METHOD FOR MANUFACTURE THEREOF

Bijkerk, F., Louis, E., Kessels, M. J. H., Verhoeven, J. & Den Hartog, H. M. J., 28 Nov 2002, IPC No. G21K 1/ 06 A I, Patent No. WO02095771, Priority date 23 May 2001, Priority No. NL20011018139

Research output: PatentProfessional

mirrors
radiation
wavelengths
thin films
manufacturing
1996

CO2 laser comprising carbon monoxide and a gold-comprising catalyst

Udalov, Y. B., Starostin, S. A., Peters, P. J. M. & Witteman, W. J., 18 Oct 1996, (Submitted) Patent No. 1e Nederland / 10102, Priority date 18 Oct 1999

Research output: PatentProfessional