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2020

Sub-stochiometric MoO3 for intermediate band solar cells

Jorge, M., Brakstad, T., Nematollahi, M., Kildemo, M. & Reenaas, T., 6 Feb 2020, 2019 IEEE 46th Photovoltaic Specialists Conference, PVSC 2019. IEEE, p. 1756-1759 4 p. 8980951

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2019

Determining the transmission of thin foil filters for soft X-ray free-electron laser radiation: an ablation imprint approach

Burian, T., Hájková, V., Saksl, K., Vozda, V., Makhotkin, I. A., Louis, E., Schreiber, S., Tiedtke, K., Toleikis, S., Keitel, B., Plönjes, E., Ruiz-Lopez, M. I., Kuhlmann, M., Wodzinski, A., Enkisch, H., Hermann, M., Strobel, S., Loch, R. A., Sobierajski, R., Jacyna, I. & 9 others, Klinger, D., Jurek, M., Pełka, J. B., de Vries, G., Störmer, M., Scholze, F., Siewert, F., Mey, T. & Chalupský, J., 14 May 2019, Optics Damage and Materials Processing by EUV/X-ray Radiation VII. (SPIE conference proceedings; vol. 11035).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

EUV Lithography at Threshold of High-Volume Manufacturing∗

Yen, A., Meiling, H. & Benschop, J., 16 Jan 2019, 2018 IEEE International Electron Devices Meeting, IEDM 2018. IEEE, p. 11.6.1-11.6.4 8614502. (Technical Digest - International Electron Devices Meeting, IEDM; vol. 2018-December).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)

Multilayer filter using the borrmann effect for euv source monitoring

Barreaux, J. L. P., Kozhevnikov, I. V., Bastiaens, H. M. J., van de Kruijs, R. W. E., Bijkerk, F. & Boller, K. J., 1 Jan 2019, Proceedings 2015 European Conference on Lasers and Electro-Optics - European Quantum Electronics Conference, CLEO/Europe-EQEC 2015. Optical Society of America

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2018

Novel EUV mask absorber evaluation in support of next-generation EUV imaging

Philipsen, V., Luong, K. V., Opsomer, K., Detavernier, C., Hendrickx, E., Erdmann, A., Evanschitzky, P., Van De Kruijs, R. W. E., Heidarnia-Fathabad, Z., Scholze, F. & Laubis, C., 10 Oct 2018, Photomask Technology 2018. Gallagher, E. E. & Rankin, J. H. (eds.). SPIE, Vol. 10810. 108100C. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 10810).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Open Access
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11 Citations (Scopus)
50 Downloads (Pure)
2017

In vacuo low-energy ions scattering studies of ZrO2 growth by magnetron sputtering

Sturm, J. M., Coloma Ribera, R., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F., 3 Nov 2017, In vacuo low-energy ions scattering studies of ZrO2 growth by magnetron sputtering.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Pellicle films supporting the ramp to HVM with EUV

van Zwol, P. J., Nasalevich, M., Voorthuijzen, W. P., Kurganova, E., Notenboom, A., Vles, D. F., Peter, M., Symens, W., Giesbers, A. J. M., Klootwijk, J. H., Van De Kruijs, R. W. E. & Zande, W. J., 2017, Photomask Technology 2017. SPIE, 9 p. 104510O. (Proceedings of SPIE; vol. 10451).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

12 Citations (Scopus)
4 Downloads (Pure)

Reducing EUV mask 3D effects by alternative metal absorbers

Philipsen, V., Luong, K. V., Souriau, L., Hendrickx, E., Erdmann, A., Xu, D., Evanschitzky, P., Van De Kruijs, R. W. E., Edrisi, A., Scholze, F., Laubis, C., Irmscher, M., Naasz, S. & Reuter, C., 24 Mar 2017, Extreme Ultraviolet (EUV) Lithography VIII. SPIE, Vol. 10143. 1014310

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

17 Citations (Scopus)
2016

Influence of the surface oxide content of a boron capping layer on UV photodetector performance

Mohammadi, V., Van De Kruijs, R. W. E., Rao, P. R., Sturm, J. M. & Nihtianov, S., 21 Mar 2016, 2015 9th International Conference on Sensing Technology, ICST 2015. IEEE Computer Society, Vol. 2016-March. p. 656-660 5 p. 7438479

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Ultra-broadband Supercontinuum Generation at Telecommunication Wavelengths in Dispersion Engineered Stoichiometric Si3N4 Waveguides

Schepers, F., Garcia Porcel, M. A., Epping, J. P., Hellwig, T., Hoekman, M., Mateman, R., Leinse, A., Heideman, R. G., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Boller, K. J., Fallnich, C. & van Rees, A., 5 Jun 2016, Conference on Lasers and Electro-Optics. San Jose, California, USA: OSA Technical Digest, p. AM3J.5-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Citation (Scopus)
2015

High reflectance La/B based multilayer mirrors for 6.x nm wavelength

Kuznetsov, D., Yakshin, A., Sturm, M., Van De Kruijs, R., Louis, E. & Bijkerk, F., 2015, Advances in X-Ray/EUV Optics and Components X. Goto, S., Morawe, C. & Khounsary, A. M. (eds.). Bellingham, WA: SPIE, 958806. (Proceedings of SPIE; vol. 9588).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Surface oxide content examination of capping boron layers in UV photodetectors

Mohammadi, V., Rao, P. R., Van De Kruijs, R. W. E. & Nihtianov, S., 3 Aug 2015, 73rd Annual Device Research Conference, DRC 2015. IEEE, Vol. 2015-August. p. 73-74 2 p. 7175562

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)
2014

A hybrid semiconductor-glass waveguide laser

Fan, Y., Oldenbeuving, R., Klein, E. J., Lee, C. J., Song, H., Khan, M. R. H., Offerhaus, H. L., van der Slot, P. J. M. & Boller, K-J., 14 Apr 2014, Laser Sources and Applications II. Mackenzie, J. I., Jelinkova, H., Taira, T. & Ahmed, M. A. (eds.). Brussels, Belgium: SPIE, 91351B. (Proceedings of SPIE; vol. 9135).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

20 Citations (Scopus)

Spectral purity enhancement for the EUV Lithography Systems by suppressing UV reflection from multilayers

Huang, Q., de Boer, M. J., Barreaux, J. L. P., Paardekooper, D. M., van den Boogaard, T., van de Kruijs, R. W. E., Zoethout, E., Louis, E. & Bijkerk, F., 2014, Extreme Ultraviolet (EUV) Lithography V. Wood, O.R. & Panning, E.M. (eds.). San Jose, CA: SPIE - The International Society for Optical Engineering, p. - (Proceedings of SPIE; vol. 9048).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Citation (Scopus)
2013

Engineering optical constants for broadband single layer antireflection coatings

Huber, S. P., van de Kruijs, R. W. E., Yakshin, A. E., Zoethout, E. & Bijkerk, F., 27 Sep 2013, Advances in X-Ray/EUV Optics and Components VIII. Khounsary, A., Goto, S. & Morawe, C. (eds.). SPIE, 884814. (Proceedings of SPIE; vol. 8848).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

3 Citations (Scopus)

EUV optical elements with enhanced spectral selectivity for IR radiation

Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Louis, E. & Bijkerk, F., 2013, 2013 International Workshop in EUV and Soft X-ray Sources. Medvedev, V. V. (ed.). Dublin, Ireland: EUV Litho, Inc., p. -

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Open Access
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10 Downloads (Pure)

Optimization of LaN/B multilayer mirrors for 6.x nm wavelength

Makhotkin, I. A., van de Kruijs, R. W. E., Zoethout, E., Louis, E. & Bijkerk, F., 25 Aug 2013, Advances in X-Ray/EUV Optics and Components VIII. Khounsary, A., Goto, S. & Morawe, C. (eds.). SPIE, p. 1-5 5 p. (Proceedings of SPIE; vol. 8848).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

3 Citations (Scopus)

Suppression of long wavelength reflection from extreme-UV multilayer optics

Huang, Q., van den Boogaard, T., van de Kruijs, R. W. E., Zoethout, E., Medvedev, V., Louis, E. & Bijkerk, F., 25 Aug 2013, Advances in X-Ray/EUV Optics and Components VIII. Khounsary, A., Goto, S. & Morawe, C. (eds.). Bellingham, WA: SPIE, p. 5- (Proceedings of SPIE; vol. 8848).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)
2012

Wavelength selection for multilayer coatings for the lithography generation beyond EUVL

Makhotkin, I. A., Zoethout, E., Louis, E., Yakunin, S. N., Muellender, S. & Bijkerk, F., 13 Mar 2012, Extreme Ultraviolet (EUV) Lithography III. Naulleau, P. P. & Wood II, O. R. (eds.). Bellingham, WA: SPIE, 5 p. 832213. (Proceedings of SPIE; vol. 8322).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)
2011

Blistering behavior in Mo/Si multilayers

Kuznetsov, A. S., Gleeson, M. A., van de Kruijs, R. W. E. & Bijkerk, F., 18 Apr 2011, SPIE Optics + Optoelectronics 2011. Kuznetsov, A. S. (ed.). SPIE, 6 p. 807713. (Proceedings of SPIE; vol. 8077).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

4 Citations (Scopus)

Interface diffusion kinetics and lifetime scaling in multilayer Bragg optics

van de Kruijs, R. W. E., Bruijn, S., Yakshin, A., Nedelcu, I. & Bijkerk, F., 2011, Advances in X-Ray/ EUV optics and Components VI: 22–24 August 2011, San Diego, California, United States. Morawe, C., Khounsary, A. M. & Goto, S. (eds.). Bellingham, WA: SPIE, 81390A. (Proceedings of SPIE; vol. 8139).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Citation (Scopus)
2010

EUV-multilayers on grating-like topographies

van den Boogaard, T., Louis, E., Goldberg, K. A., Mochi, I. & Bijkerk, F., 2010, Extreme Ultraviolet (EUV) Lithography: 22–25 February 2010, San Jose, California, United States. La Fontaine, B. M. (ed.). San Jose, CA, USA: SPIE - The International Society for Optical Engineering, 5 p. (Proceedings of SPIE; vol. 7636).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

High reflectance multilayers for EUVL HVM-projection optics

Louis, E., van Hattum, E. D., Alonso van der Westen, S., Sallé, P., Grootkarzijn, K., Zoethout, E., Bijkerk, F., von Blanckenhagen, G. & Müllender, S., 22 Mar 2010, Extreme Ultraviolet (EUV) Lithography. La Fontaine, B. M. (ed.). San Jose, USA: SPIE - The International Society for Optical Engineering, Vol. 7636. 5 p. 76362T. (Proceedings of SPIE; vol. 7636).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

4 Citations (Scopus)

ZFEL: a compact, soft X-ray FEL in the Netherlands

Beijers, J. P. M., Brandenburg, S., Eikema, K. S. E., Hoekstra, S., Jungmann, K., Schlathölter, T., Timmermans, R. G. E., Willmann, R., Hoekstra, R., van Loosdrecht, P. H. M., Noheda, B., Palstra, T. T. M., Rudolf, P., Luiten, O. J. & Bijkerk, F., 23 Aug 2010, Free Electron Laser (FEL) Conference 2010, Malmö, Sweden. Malmö, Sweden, p. 163-164

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Open Access
5 Citations (Scopus)
2009

Improved contrast and reflectivity of multilayer reflective optics for wavelenghts beyond the Extreme UV

Tsarfati, T., Zoethout, E., Louis, E., van de Kruijs, R. W. E., Yakshin, A., Müllender, S. & Bijkerk, F., 24 Feb 2009, Proceedings of SPIE, The International Society for Optical Engineering. Schellenberg, F. M. & La Fontaine, B. M. (eds.). San Jose, CA, USA: SPIE, p. 72713V- (Proceedings of SPIE; vol. 7271).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

14 Citations (Scopus)
2008

Smoothing properties of single- and multilayer coatings, a method to smoothen substrates

Van Den Boogaard, A. J. R., Louis, E., Zoethout, E., Van Der Westen, S. A., Bijkerk, F. & Müllender, S., 1 Dec 2008, Emerging Lithographic Technologies XII. 69210R. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6921).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

3 Citations (Scopus)
2006

Characterization of large off-axis EUV mirrors with high accuracy reflectometry at PTB

Laubis, C., Buchholz, C., Fischer, A., Plöger, S., Scholz, F., Wagner, H., Scholze, F., Ulm, G., Enkisch, H., Müllender, S., Wedowski, M., Louis, E. & Zoethout, E., 10 Jul 2006, Emerging Lithographic Technologies X. 61510I. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6151 I).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Open Access
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19 Citations (Scopus)
8 Downloads (Pure)
2001

Integrating e-mail use in design & technology lessons

van der Meij, H., van Graft, M. & Boersma, K., 2001, New media in Technology Education: Proceedings PATT-11 Conference, March 8-13 2001. Mottier, I. & de Vries, M. J. (eds.). Eindhoven: Eindhoven University of Technology, p. 153-168

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Open Access
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2 Downloads (Pure)