Research Output 2001 2020

Filter
Conference contribution
2019
1 Citation (Scopus)

EUV Lithography at Threshold of High-Volume Manufacturing∗

Yen, A., Meiling, H. & Benschop, J., 16 Jan 2019, 2018 IEEE International Electron Devices Meeting, IEDM 2018. IEEE, p. 11.6.1-11.6.4 8614502. (Technical Digest - International Electron Devices Meeting, IEDM; vol. 2018-December).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Extreme ultraviolet lithography
lithography
manufacturing
Throughput
thresholds

Multilayer filter using the borrmann effect for euv source monitoring

Barreaux, J. L. P., Kozhevnikov, I. V., Bastiaens, H. M. J., van de Kruijs, R. W. E., Bijkerk, F. & Boller, K. J., 1 Jan 2019, Proceedings 2015 European Conference on Lasers and Electro-Optics - European Quantum Electronics Conference, CLEO/Europe-EQEC 2015. Optical Society of America, (Proceedings 2015 European Conference on Lasers and Electro-Optics - European Quantum Electronics Conference, CLEO/Europe-EQEC 2015).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2018
6 Citations (Scopus)
3 Downloads (Pure)

Novel EUV mask absorber evaluation in support of next-generation EUV imaging

Philipsen, V., Luong, K. V., Opsomer, K., Detavernier, C., Hendrickx, E., Erdmann, A., Evanschitzky, P., Van De Kruijs, R. W. E., Heidarnia-Fathabad, Z., Scholze, F. & Laubis, C., 10 Oct 2018, Photomask Technology 2018. Gallagher, E. E. & Rankin, J. H. (eds.). SPIE, Vol. 10810. 108100C. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 10810).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Open Access
File
EUV Mask
Absorber
Mask
Masks
absorbers
2017

In vacuo low-energy ions scattering studies of ZrO2 growth by magnetron sputtering

Sturm, J. M., Coloma Ribera, R., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F., 3 Nov 2017, In vacuo low-energy ions scattering studies of ZrO2 growth by magnetron sputtering.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

ion scattering
magnetron sputtering
passivity
energy
silicates
10 Citations (Scopus)
2 Downloads (Pure)

Pellicle films supporting the ramp to HVM with EUV

van Zwol, P. J., Nasalevich, M., Voorthuijzen, W. P., Kurganova, E., Notenboom, A., Vles, D. F., Peter, M., Symens, W., Giesbers, A. J. M., Klootwijk, J. H., Van De Kruijs, R. W. E. & Zande, W. J., 2017, Photomask Technology 2017. SPIE, 9 p. 104510O. (Proceedings of SPIE; vol. 10451).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

pellicle
ramps
Silicides
Graphite
silicides
14 Citations (Scopus)

Reducing EUV mask 3D effects by alternative metal absorbers

Philipsen, V., Luong, K. V., Souriau, L., Hendrickx, E., Erdmann, A., Xu, D., Evanschitzky, P., Van De Kruijs, R. W. E., Edrisi, A., Scholze, F., Laubis, C., Irmscher, M., Naasz, S. & Reuter, C., 24 Mar 2017, Extreme Ultraviolet (EUV) Lithography VIII. SPIE, Vol. 10143. 1014310

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

absorbers (materials)
EUV Mask
Absorber
Masks
absorbers
2016

Influence of the surface oxide content of a boron capping layer on UV photodetector performance

Mohammadi, V., Van De Kruijs, R. W. E., Rao, P. R., Sturm, J. M. & Nihtianov, S., 21 Mar 2016, 2015 9th International Conference on Sensing Technology, ICST 2015. IEEE Computer Society, Vol. 2016-March. p. 656-660 5 p. 7438479

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Photodetectors
Boron
Chemical vapor deposition
Oxides
Physical vapor deposition
1 Citation (Scopus)

Ultra-broadband Supercontinuum Generation at Telecommunication Wavelengths in Dispersion Engineered Stoichiometric Si3N4 Waveguides

Schepers, F., Garcia Porcel, M. A., Epping, J. P., Hellwig, T., Hoekman, M., Mateman, R., Leinse, A., Heideman, R. G., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Boller, K. J., Fallnich, C. & van Rees, A., 5 Jun 2016, Conference on Lasers and Electro-Optics. San Jose, California, USA: OSA Technical Digest, p. AM3J.5-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

telecommunication
broadband
waveguides
wavelengths
pumps
2015

High reflectance La/B based multilayer mirrors for 6.x nm wavelength

Kuznetsov, D., Yakshin, A., Sturm, M., Van De Kruijs, R., Louis, E. & Bijkerk, F., 2015, Advances in X-Ray/EUV Optics and Components X. Goto, S., Morawe, C. & Khounsary, A. M. (eds.). Bellingham, WA: SPIE, 958806. (Proceedings of SPIE; vol. 9588).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Reflectivity
Reflectance
Multilayer
Mirror
Multilayers
1 Citation (Scopus)

Surface oxide content examination of capping boron layers in UV photodetectors

Mohammadi, V., Rao, P. R., Van De Kruijs, R. W. E. & Nihtianov, S., 3 Aug 2015, 73rd Annual Device Research Conference, DRC 2015. IEEE, Vol. 2015-August. p. 73-74 2 p. 7175562

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Photodetectors
Boron
Ultraviolet detectors
Oxides
Photodiodes
2014

Multilayer filter using the borrmann effect for EUV source monitoring

Barreaux, J. L. P., Kozhevnikov, I. V., Bastiaens, H. M. J., van de Kruijs, R. W. E., Bijkerk, F. & Boller, K. J., 21 Jul 2014, European Conference on Lasers and Electro-Optics, CLEO 2015. Optical Society of America

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Citation (Scopus)

Spectral purity enhancement for the EUV Lithography Systems by suppressing UV reflection from multilayers

Huang, Q., de Boer, M. J., Barreaux, J. L. P., Paardekooper, D. M., van den Boogaard, T., van de Kruijs, R. W. E., Zoethout, E., Louis, E. & Bijkerk, F., 2014, Extreme Ultraviolet (EUV) Lithography V. Wood, O.R. & Panning, E.M. (eds.). San Jose, CA: SPIE - The International Society for Optical Engineering, p. - (Proceedings of SPIE; vol. 9048).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

ultraviolet reflection
purity
lithography
pyramids
augmentation
2013
2 Citations (Scopus)

Engineering optical constants for broadband single layer antireflection coatings

Huber, S. P., van de Kruijs, R. W. E., Yakshin, A. E., Zoethout, E. & Bijkerk, F., 27 Sep 2013, Advances in X-Ray/EUV Optics and Components VIII. Khounsary, A., Goto, S. & Morawe, C. (eds.). SPIE, 884814. (Proceedings of SPIE; vol. 8848).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

antireflection coatings
retarding
engineering
broadband
nitrogen ions
9 Downloads (Pure)

EUV optical elements with enhanced spectral selectivity for IR radiation

Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Louis, E. & Bijkerk, F., 2013, 2013 International Workshop in EUV and Soft X-ray Sources. Medvedev, V. V. (ed.). Dublin, Ireland: EUV Litho, Inc., p. -

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Open Access
File
3 Citations (Scopus)

Optimization of LaN/B multilayer mirrors for 6.x nm wavelength

Makhotkin, I. A., van de Kruijs, R. W. E., Zoethout, E., Louis, E. & Bijkerk, F., 25 Aug 2013, Advances in X-Ray/EUV Optics and Components VIII. Khounsary, A., Goto, S. & Morawe, C. (eds.). SPIE, p. 1-5 5 p. (Proceedings of SPIE; vol. 8848).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

mirrors
reflectance
optimization
wavelengths
magnetron sputtering
2 Citations (Scopus)

Suppression of long wavelength reflection from extreme-UV multilayer optics

Huang, Q., van den Boogaard, T., van de Kruijs, R. W. E., Zoethout, E., Medvedev, V., Louis, E. & Bijkerk, F., 25 Aug 2013, Advances in X-Ray/EUV Optics and Components VIII. Khounsary, A., Goto, S. & Morawe, C. (eds.). Bellingham, WA: SPIE, p. 5- (Proceedings of SPIE; vol. 8848).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

retarding
optics
wavelengths
gratings
extreme ultraviolet radiation
2012
2 Citations (Scopus)

Wavelength selection for multilayer coatings for the lithography generation beyond EUVL

Makhotkin, I. A., Zoethout, E., Louis, E., Yakunin, S. N., Muellender, S. & Bijkerk, F., 13 Mar 2012, Extreme Ultraviolet (EUV) Lithography III. Naulleau, P. P. & Wood II, O. R. (eds.). Bellingham, WA: SPIE, 5 p. 832213. (Proceedings of SPIE; vol. 8322).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

lithography
coatings
mirrors
reflectance
wavelengths
2010

EUV-multilayers on grating-like topographies

van den Boogaard, T., Louis, E., Goldberg, K. A., Mochi, I. & Bijkerk, F., 2010, Extreme Ultraviolet (EUV) Lithography: 22–25 February 2010, San Jose, California, United States. La Fontaine, B. M. (ed.). San Jose, CA, USA: SPIE - The International Society for Optical Engineering, 5 p. (Proceedings of SPIE; vol. 7636).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

topography
anomaly
periodicity
transmission electron microscopy
microscopy
4 Citations (Scopus)

High reflectance multilayers for EUVL HVM-projection optics

Louis, E., van Hattum, E. D., Alonso van der Westen, S., Sallé, P., Grootkarzijn, K., Zoethout, E., Bijkerk, F., von Blanckenhagen, G. & Müllender, S., 22 Mar 2010, Extreme Ultraviolet (EUV) Lithography. La Fontaine, B. M. (ed.). San Jose, USA: SPIE - The International Society for Optical Engineering, Vol. 7636. 5 p. 76362T. (Proceedings of SPIE; vol. 7636).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

projection
optics
reflectance
coatings
coating
5 Citations (Scopus)

ZFEL: a compact, soft X-ray FEL in the Netherlands

Beijers, J. P. M., Brandenburg, S., Eikema, K. S. E., Hoekstra, S., Jungmann, K., Schlathölter, T., Timmermans, R. G. E., Willmann, R., Hoekstra, R., van Loosdrecht, P. H. M., Noheda, B., Palstra, T. T. M., Rudolf, P., Luiten, O. J. & Bijkerk, F., 23 Aug 2010, Free Electron Laser (FEL) Conference 2010, Malmö, Sweden. Malmö, Sweden, p. 163-164

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Open Access
Netherlands
free electron lasers
molecular physics
biochemistry
atomic physics
2008
3 Citations (Scopus)

Smoothing properties of single- and multilayer coatings, a method to smoothen substrates

Van Den Boogaard, A. J. R., Louis, E., Zoethout, E., Van Der Westen, S. A., Bijkerk, F. & Müllender, S., 1 Dec 2008, Emerging Lithographic Technologies XII. 69210R. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6921).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

smoothing
Coating
Multilayer
Smoothing
Multilayers
2001

Integrating e-mail use in design & technology lessons

van der Meij, H., Boersma, K. T., van Graft, M. & van Graft, M., 2001, Proceedings from the PATT-11 Conference: New media in Technology Education, 08-03-2001 t/m 13-03-2001. p. -

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review