XUV Optics

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  • 2023

    Actinic Inspection of the EUV Optical Parameters of Lithographic Materials with Lab-Based Radiometry and Reflectometry

    Dorney, K. M., Kissoon, N. N., Holzmeier, F., Larsen, E. W., Singh, D. P., Arvind, S., Santra, S., Fallica, R., Makhotkin, I., Philipsen, V., De Gendt, S., Fleischmann, C., van der Heide, P. A. W. & Petersen, J. S., 28 Apr 2023, Optical and EUV Nanolithography XXXVI. Lio, A. (ed.). SPIE, 1249407. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 12494).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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    4 Citations (Scopus)
    77 Downloads (Pure)

  • Precise optical constant determination in the soft X-ray, EUV, and VUV spectral range

    Abbasirad, N., Saadeh, Q., Ciesielski, R., Gottwald, A., Philippsen, V., Makhotkin, I., Sokolov, A., Kolbe, M., Scholze, F. & Soltwisch, V., 27 Apr 2023, Metrology, Inspection, and Process Control XXXVII. Robinson, J. C. & Sendelbach, M. J. (eds.). SPIE, 124963B. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 12496).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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  • 2022

    Generation of 2-micrometer wavelength laser-light to drive euv-emitting plasmas

    Behnke, L., Mostafa, Y. Y., Schupp, R., Bouza, Z., Lassise, A., Bayraktar, M., Sheil, J., Hoekstra, R., Ubachs, W. & Versolato, O. O., 2022, Mid-Infrared Coherent Sources, MICS 2022. Optica Publishing Group (formerly OSA), JW5A.8. (Optics InfoBase Conference Papers).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

  • Solid-state-laser driven plasma produced from laser-preformed tin microdroplets for high-brightness EUV

    Versolato, O. O., Schupp, R., Behnke, L., Mostafa, Y. Y., Bouza, Z., Lassise, A., Bayraktar, M., Sheil, J., Hoekstra, R. & Ubachs, W., 2022, Compact EUV and X-ray Light Sources, EUVXRAY 2022. Optica Publishing Group (formerly OSA), ETh5A.7. (Optics InfoBase Conference Papers).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

  • 2020

    Spectral purity performance of high-power EUV systems

    van de Kerkhof, M., Liu, F., Meeuwissen, M., Zhang, X., de Kruif, R., Davydova, N., Schiffelers, G., Wählish, F., van Setten, E., Varenkamp, W., Ricken, K., de Winter, L., McNamara, J. & Bayraktar, M., 23 Mar 2020, Extreme Ultraviolet (EUV) Lithography XI. Felix, N. M. & Lio, A. (eds.). SPIE, Vol. 11323. 16 p. 1132321. (SPIE Conference Proceedings; vol. 1323).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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    8 Citations (Scopus)
    485 Downloads (Pure)

  • Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography

    Versolato, O., Bayerle, A., Bayraktar, M., Behnke, L., Bekker, H., Bouza, Z., Colgan, J., Crespo Lopez-Urrutia, J., Deuzeman, M. J., Hoekstra, R., Kurilovich, D., Poirier, L., Liu, B., Meijer, R., Neukirch, A., Rai, S., Ryabtsev, A., Witte, S., Scheers, J. & Schupp, R. & 3 others, Sheil, J., Torretti, F. & Ubachs, W., 11 Jun 2020, Journal of Physics: Conference Series: Plasmas & Particle acceleration. 19 ed. Vol. 1412. (Journal of physics: Conference series).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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  • Sub-stochiometric MoO3 for intermediate band solar cells

    Jorge, M., Brakstad, T., Nematollahi, M., Kildemo, M. & Reenaas, T., 6 Feb 2020, 2019 IEEE 46th Photovoltaic Specialists Conference, PVSC 2019. IEEE, p. 1756-1759 4 p. 8980951

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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    1 Citation (Scopus)
    46 Downloads (Pure)
  • 2019

    Determining the transmission of thin foil filters for soft X-ray free-electron laser radiation: an ablation imprint approach

    Burian, T., Hájková, V., Saksl, K., Vozda, V., Makhotkin, I. A., Louis, E., Schreiber, S., Tiedtke, K., Toleikis, S., Keitel, B., Plönjes, E., Ruiz-Lopez, M. I., Kuhlmann, M., Wodzinski, A., Enkisch, H., Hermann, M., Strobel, S., Loch, R. A., Sobierajski, R. & Jacyna, I. & 9 others, Klinger, D., Jurek, M., Pełka, J. B., de Vries, G., Störmer, M., Scholze, F., Siewert, F., Mey, T. & Chalupský, J., 14 May 2019, Optics Damage and Materials Processing by EUV/X-ray Radiation VII. (SPIE conference proceedings; vol. 11035).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

  • EUV Lithography at Threshold of High-Volume Manufacturing∗

    Yen, A., Meiling, H. & Benschop, J., 16 Jan 2019, 2018 IEEE International Electron Devices Meeting, IEDM 2018. IEEE, p. 11.6.1-11.6.4 8614502. (Technical Digest - International Electron Devices Meeting, IEDM; vol. 2018-December).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    3 Citations (Scopus)
    5 Downloads (Pure)
  • 2018

    Novel EUV mask absorber evaluation in support of next-generation EUV imaging

    Philipsen, V., Luong, K. V., Opsomer, K., Detavernier, C., Hendrickx, E., Erdmann, A., Evanschitzky, P., Van De Kruijs, R. W. E., Heidarnia-Fathabad, Z., Scholze, F. & Laubis, C., 10 Oct 2018, Photomask Technology 2018. Gallagher, E. E. & Rankin, J. H. (eds.). SPIE, Vol. 10810. 108100C. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 10810).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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    36 Citations (Scopus)
    675 Downloads (Pure)
  • 2017

    In vacuo low-energy ions scattering studies of ZrO2 growth by magnetron sputtering

    Sturm, M., Coloma Ribera, R., van de Kruijs, R., Yakshin, A. & Bijkerk, F., 3 Nov 2017, In vacuo low-energy ions scattering studies of ZrO2 growth by magnetron sputtering.

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic

  • Pellicle films supporting the ramp to HVM with EUV

    van Zwol, P. J., Nasalevich, M., Voorthuijzen, W. P., Kurganova, E., Notenboom, A., Vles, D. F., Peter, M., Symens, W., Giesbers, A. J. M., Klootwijk, J. H., van de Kruijs , R. W. E. & van der Zande, W. J., 2017, Photomask Technology 2017. SPIE, 9 p. 104510O. (Proceedings of SPIE; vol. 10451).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    32 Citations (Scopus)
    82 Downloads (Pure)

  • Reducing EUV mask 3D effects by alternative metal absorbers

    Philipsen, V., Luong, K. V., Souriau, L., Hendrickx, E., Erdmann, A., Xu, D., Evanschitzky, P., Van De Kruijs, R. W. E., Edrisi, A., Scholze, F., Laubis, C., Irmscher, M., Naasz, S. & Reuter, C., 24 Mar 2017, Extreme Ultraviolet (EUV) Lithography VIII. SPIE, Vol. 10143. 1014310

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    35 Citations (Scopus)
  • 2016

    Influence of the surface oxide content of a boron capping layer on UV photodetector performance

    Mohammadi, V., Van De Kruijs, R. W. E., Rao, P. R., Sturm, J. M. & Nihtianov, S., 21 Mar 2016, 2015 9th International Conference on Sensing Technology, ICST 2015. IEEE, Vol. 2016-March. p. 656-660 5 p. 7438479

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

  • Ultra-broadband Supercontinuum Generation at Telecommunication Wavelengths in Dispersion Engineered Stoichiometric Si3N4 Waveguides

    Schepers, F., Garcia Porcel, M. A., Epping, J. P., Hellwig, T., Hoekman, M., Mateman, R., Leinse, A., Heideman, R. G., van Rees, A., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Boller, K.-J. & Fallnich, C., 5 Jun 2016, CLEO: Applications and Technology, CLEO AT 2016. San Jose, California, USA: Optica Publishing Group (formerly OSA), AM3J.5. (Optics InfoBase Conference Papers).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    1 Citation (Scopus)
    5 Downloads (Pure)
  • 2015

    High reflectance La/B based multilayer mirrors for 6.x nm wavelength

    Kuznetsov, D., Yakshin, A., Sturm, M., Van De Kruijs, R., Louis, E. & Bijkerk, F., 2015, Advances in X-Ray/EUV Optics and Components X. Goto, S., Morawe, C. & Khounsary, A. M. (eds.). Bellingham, WA: SPIE, 958806. (Proceedings of SPIE; vol. 9588).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    4 Citations (Scopus)
    4 Downloads (Pure)

  • Surface oxide content examination of capping boron layers in UV photodetectors

    Mohammadi, V., Rao, P. R., Van De Kruijs, R. W. E. & Nihtianov, S., 3 Aug 2015, 73rd Annual Device Research Conference, DRC 2015. IEEE, Vol. 2015-August. p. 73-74 2 p. 7175562

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    2 Citations (Scopus)
  • 2014

    A hybrid semiconductor-glass waveguide laser

    Fan, Y., Oldenbeuving, R., Klein, E. J., Lee, C. J., Song, H., Khan, M. R. H., Offerhaus, H. L., van der Slot, P. J. M. & Boller, K.-J., 14 Apr 2014, Laser Sources and Applications II. Mackenzie, J. I., Jelinkova, H., Taira, T. & Ahmed, M. A. (eds.). Brussels, Belgium: SPIE, 91351B. (Proceedings of SPIE; vol. 9135).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    29 Citations (Scopus)
    10 Downloads (Pure)

  • Multilayer filter using the borrmann effect for EUV source monitoring

    Barreaux, J. L. P., Kozhevnikov, I. V., Bastiaens, H. M. J., van de Kruijs, R. W. E., Bijkerk, F. & Boller, K. J., 21 Jul 2014, European Conference on Lasers and Electro-Optics, CLEO 2015. Optical Society of America, (Optics InfoBase Conference Papers).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

  • Spectral purity enhancement for the EUV Lithography Systems by suppressing UV reflection from multilayers

    Huang, Q., de Boer, M., Barreaux, J., Paardekooper, D. M., van den Boogaard, T., van de Kruijs, R., Zoethout, E., Louis, E. & Bijkerk, F., 2014, Extreme Ultraviolet (EUV) Lithography V. Wood, O. R. & Panning, E. M. (eds.). San Jose, CA: SPIE, 5 p. 90480G. (Proceedings of SPIE; vol. 9048).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    3 Citations (Scopus)
    2 Downloads (Pure)
  • 2013

    Engineering optical constants for broadband single layer antireflection coatings

    Huber, S. P., van de Kruijs, R. W. E., Yakshin, A. E., Zoethout, E. & Bijkerk, F., 27 Sept 2013, Advances in X-Ray/EUV Optics and Components VIII. Khounsary, A., Goto, S. & Morawe, C. (eds.). SPIE, 884814. (Proceedings of SPIE; vol. 8848).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    4 Citations (Scopus)
    7 Downloads (Pure)

  • EUV optical elements with enhanced spectral selectivity for IR radiation

    Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Louis, E. & Bijkerk, F., 2013, 2013 International Workshop in EUV and Soft X-ray Sources. Medvedev, V. V. (ed.). Dublin, Ireland: EUV Litho, Inc., p. -

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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  • Optimization of LaN/B multilayer mirrors for 6.x nm wavelength

    Makhotkin, I. A., van de Kruijs, R. W. E., Zoethout, E., Louis, E. & Bijkerk, F., 25 Aug 2013, Advances in X-Ray/EUV Optics and Components VIII. Khounsary, A., Goto, S. & Morawe, C. (eds.). SPIE, p. 1-5 5 p. (Proceedings of SPIE; vol. 8848).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    3 Citations (Scopus)
    10 Downloads (Pure)

  • Suppression of long wavelength reflection from extreme-UV multilayer optics

    Huang, Q., van den Boogaard, T., van de Kruijs, R. W. E., Zoethout, E., Medvedev, V., Louis, E. & Bijkerk, F., 25 Aug 2013, Advances in X-Ray/EUV Optics and Components VIII. Khounsary, A., Goto, S. & Morawe, C. (eds.). Bellingham, WA: SPIE, p. 5- (Proceedings of SPIE; vol. 8848).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    2 Citations (Scopus)
    5 Downloads (Pure)
  • 2012

    Wavelength selection for multilayer coatings for the lithography generation beyond EUVL

    Makhotkin, I. A., Zoethout, E., Louis, E., Yakunin, S. N., Muellender, S. & Bijkerk, F., 13 Mar 2012, Extreme Ultraviolet (EUV) Lithography III. Naulleau, P. P. & Wood II, O. R. (eds.). Bellingham, WA: SPIE, 5 p. 832213. (Proceedings of SPIE; vol. 8322).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    3 Citations (Scopus)
    8 Downloads (Pure)
  • 2011

    Blistering behavior in Mo/Si multilayers

    Kuznetsov, A. S., Gleeson, M. A., van de Kruijs, R. W. E. & Bijkerk, F., 18 Apr 2011, SPIE Optics + Optoelectronics 2011. Kuznetsov, A. S. (ed.). SPIE, 6 p. 807713. (Proceedings of SPIE; vol. 8077).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    8 Citations (Scopus)
    15 Downloads (Pure)

  • Interface diffusion kinetics and lifetime scaling in multilayer Bragg optics

    van de Kruijs, R. W. E., Bruijn, S., Yakshin, A., Nedelcu, I. & Bijkerk, F., 2011, Advances in X-Ray/ EUV optics and Components VI: 22–24 August 2011, San Diego, California, United States. Morawe, C., Khounsary, A. M. & Goto, S. (eds.). Bellingham, WA: SPIE, 81390A. (Proceedings of SPIE; vol. 8139).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    1 Citation (Scopus)
    4 Downloads (Pure)
  • 2010

    EUV-multilayers on grating-like topographies

    van den Boogaard, T., Louis, E., Goldberg, K. A., Mochi, I. & Bijkerk, F., 2010, Extreme Ultraviolet (EUV) Lithography: 22–25 February 2010, San Jose, California, United States. La Fontaine, B. M. (ed.). San Jose, CA, USA: SPIE, 5 p. (Proceedings of SPIE; vol. 7636).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    10 Downloads (Pure)

  • High reflectance multilayers for EUVL HVM-projection optics

    Louis, E., van Hattum, E. D., Alonso van der Westen, S., Sallé, P., Grootkarzijn, K., Zoethout, E., Bijkerk, F., von Blanckenhagen, G. & Müllender, S., 22 Mar 2010, Extreme Ultraviolet (EUV) Lithography. La Fontaine, B. M. (ed.). San Jose, USA: SPIE, Vol. 7636. 5 p. 76362T. (Proceedings of SPIE; vol. 7636).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    6 Citations (Scopus)
    10 Downloads (Pure)

  • ZFEL: a compact, soft X-ray FEL in the Netherlands

    Beijers, J. P. M., Brandenburg, S., Eikema, K. S. E., Hoekstra, S., Jungmann, K., Schlathölter, T., Timmermans, R. G. E., Willmann, R., Hoekstra, R., van Loosdrecht, P. H. M., Noheda, B., Palstra, T. T. M., Rudolf, P., Luiten, O. J. & Bijkerk, F., 23 Aug 2010, Free Electron Laser (FEL) Conference 2010, Malmö, Sweden. Malmö, Sweden, p. 163-164

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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    6 Citations (Scopus)
    3 Downloads (Pure)
  • 2009

    Coating of silicon pore optics

    Jensen, C. P., Ackermann, M., Christensen, F. E., Collon, M. J. & Krumrey, M., 31 Aug 2009, Optics for EUV, X-Ray, and Gamma-Ray Astronomy IV. O'Dell, S. L. & Pareschi, G. (eds.). Bellingham, Washington: SPIE, (Proceedings of the SPIE; vol. 7437).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    16 Citations (Scopus)
  • 2008

    Smoothing properties of single- and multilayer coatings, a method to smoothen substrates

    Van Den Boogaard, A. J. R., Louis, E., Zoethout, E., Van Der Westen, S. A., Bijkerk, F. & Müllender, S., 1 Dec 2008, Emerging Lithographic Technologies XII. 69210R. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6921).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

    3 Citations (Scopus)
  • 2006

    Characterization of large off-axis EUV mirrors with high accuracy reflectometry at PTB

    Laubis, C., Buchholz, C., Fischer, A., Plöger, S., Scholz, F., Wagner, H., Scholze, F., Ulm, G., Enkisch, H., Müllender, S., Wedowski, M., Louis, E. & Zoethout, E., 10 Jul 2006, Emerging Lithographic Technologies X. 61510I. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6151 I).

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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    19 Citations (Scopus)
    200 Downloads (Pure)
  • 2001

    Integrating e-mail use in design & technology lessons

    van der Meij, H., van Graft, M. & Boersma, K., 2001, New media in Technology Education: Proceedings PATT-11 Conference, March 8-13 2001. Mottier, I. & de Vries, M. J. (eds.). Eindhoven: Eindhoven University of Technology, p. 153-168

    Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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