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2016

Research in the Industrial Focus Group XUV Optics

Sturm, J. M. & Bijkerk, F., 26 May 2016, Delft

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2011

B4C/Si based EUV multilayer mirror with suppressed reflectivity for CO2 laser radiation

Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Yakunin, S. N. & Bijkerk, F., 2011, Maui, Hawaii, US

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Chemical interaction of B4C diffusion barriers with Mo/Si layered nanostructures

Nyabero, S. L., 2011, Veldhoven, Netherlands

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Comparative damage studies in multilayer optics induced by intense short-wavelength pulses from FLASH and LCLS

Loch, R. A., Sobierajski, R., Bostedt, C., Bozek, J., Bruijn, S., Burian, T., Chalupsky, J., Feng, Y., Gaudin, J., Graf, A., van Hattum, E. D., Hau-Riege, S., Juha, L., Khorsand, A. R., Klinger, D., van de Kruijs, R. W. E., Krzywinski, J., London, R., Louis, E., Messerschmidt, M. & 4 others, Moeller, S., Schlotter, W., Tiedtke, K. & Bijkerk, F., 2011, Hamburg

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Damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs

Loch, R. A., 2011, Veldhoven, Netherlands

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Damage in Mo/Si multilayer optics irradiated by intense short-wavelength FELs

Louis, E., Sobierajski, R., Loch, R. A., Bostedt, C., Bozek, J., Burian, T., Chalupsky, J., Gaudin, J., Graf, A., Grzonka, J., Hajkova, V., Hau-Riege, S. P., van Hattum, E. D., Juha, L., Klinger, D., Krzywinski, J., London, R., Messerschmidt, M., Moeller, S., Plocinski, T. & 3 others, Wawro, A., Zabierowski, P. & Bijkerk, F., 2011, Prague

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Depth profiling of Mo/Si multilayers: the effect of Ar-ion energy on layer structure

Zoethout, E., Louis, E. & Bijkerk, F., 2011, Paris, Fr

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Diffraction of EUV radiation on free-standing grid structures: theory and experiment

Medvedev, V., 2011, Veldhoven, Netherlands

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EUV multilayer mirror with suppressed reflectivity for CO2 laser radiation

Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Yakunin, S. N. & Bijkerk, F., 2011, Miami, Florida

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Fiber-based ellipsometry for in situ monitoring

Liu, F., Lee, C. J., Chen, J., Louis, E. & Bijkerk, F., 2011, Baltimore, US

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Kinetic study of EUV-induced plasma chemistry

Astakhov, D., Goedheer, W. J. & Lopaev, D., 2011, Rijnhuizen

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Multilayer based solutions for suppression of IR radiation in EUV systems

Medvedev, V., van den Boogaard, T., van de Kruijs, R. W. E., Yakshin, A., Louis, E., Krivtsun, V. M., Yakunin, S. N. & Bijkerk, F., 2011, Veldhoven

Research output: Other contributionOther research output

Multilayers for the lithography generation beyond EUVL

Makhotkin, I. A., Zoethout, E., Louis, E., Yakunin, A. M. & Bijkerk, F., 2011, Veldhoven

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Negating HIO-induced metal and carbide EUV surface contamination

Sturm, J. M., Gleeson, M., van de Kruijs, R. W. E., Lee, C. J., Kleyn, A. W. & Bijkerk, F., 2011

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Nitrogen Passivation in La/B4C Layered Structures

Makhotkin, I. A., Zoethout, E., Louis, E. & Bijkerk, F., 2011, Bulgaria

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Non-constant diffusion rate in sub nanometer thick Mo-Si interlayers

Bosgra, J., Yakshin, A. & Bijkerk, F., 2011, Dijon, France

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Structural properties of sub nanometer thick layers to enhance EUV multilayer mirror reflectance

Bosgra, J., van de Kruijs, R. W. E., Zoethout, E., Verhoeven, J., Yakshin, A. & Bijkerk, F., 2011, Veldhoven, Netherlands

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The Interaction of Hyperthermal Argon Atoms with CO-covered Ru(0001): Scattering and Collision-Induced Desorption

Gleeson, M., Ueta, H. & Kleyn, A. W., 2011, Veldhoven, Netherlands

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5 Citations (Scopus)

Thermal damage in Mo/Si based multilayers for short-wavelength FELs

Yakshin, A., Van de Kruis, R. W. E., Sobierajski, R., Louis, E., Bruijn, S., Loch, R. A. & Bijkerk, F., 2011, Kyoto, Japan

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Understanding solid state diffusion in multilayered structures on a picometer lengthscale

van de Kruijs, R. W. E., Bruijn, S. & de Rooij-Lohmann, V. I. T. A., 2011, Veldhoven, Netherlands

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Wavelength selection for multilayer coatings for the lithography generation beyond EUVL

Makhotkin, I. A., Zoethout, E., Louis, E., Muellender, S. & Bijkerk, F., 2011, Miami, Florida (US)

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