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Patent
2020

Mirror for a microlithographic projection exposure system, and method for operating a deformable mirror

Lippert, J., Gruner, T., Hild, K., Lucke, P. & Nematollahi, M., 30 Jan 2020, IPC No. G03F 7/ 20 A I, Patent No. WO2020020550, Priority date 26 Jul 2018, Priority No. DE201810212508

Research output: Patent

Mirror, in particular for a microlithographic projection exposure system

Wylie-Van Eerd, B., Bijkerk, F., Hild, K., Gruner, T., Schulte, S. & Weyler, S., 14 Feb 2019, IPC No. G21K 1/ 06 A I, Patent No. WO2019029990, Priority date 9 Aug 2017, Priority No. DE201710213900

Research output: Patent

2018

Method, apparatus and computer program for measuring and processing a spectrum of an XUV light source from soft x-rays to infrared wavelengths

Bijkerk, F., Bayraktar, M., Bastiaens, H. M. J. & Bruineman, C., 11 May 2018, IPC No. 164742.NL Dokter Octrooibureau, WO2018/084708 A1, Patent No. 2017729 IDF, Priority date 7 Nov 2016

Research output: Patent

2016

EUV-mirror, optical system with EUV-mirror and associated operating method

Dinger, U., Bijkerk, F., Bayraktar, M. & Dier, O., 29 Dec 2016, (Submitted) Patent No. US201615262272 20160912, Priority date 21 Mar 2012

Research output: Patent

EUV multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror

Huang, Q., Louis, E., Bijkerk, F., de Boer, M. J. & von Blanckenhagen, G., 18 Aug 2016, (Submitted) Patent No. WO2015EP52767 20150210, Priority date 10 Feb 2015, Priority No. WO2015EP52767 20150210

Research output: Patent

Kombinierter Reflektor und Filter für Licht underschiedlicher Wellenlängen

Medvedev, V., Yakshin, A., Krivtsun, V. M. & Bijkerk, F., 18 Feb 2016, (Submitted) Patent No. P20448DE1, Priority date 11 May 2015, Priority No. 10 2014 216 109.6

Research output: Patent

Reflectivity tuning through controlled hydrogenation

Lee, C. J. & Bijkerk, F., 27 Oct 2016, (Submitted) Patent No. P21855/de, Priority date 18 Aug 2016, Priority No. G02B 1/10 (2015/01)

Research output: Patent

Spiegel, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage

Medvedev, V., Yakshin, A. & Bijkerk, F., 10 Mar 2016, (Submitted) Patent No. P21487DE, Priority date 13 Mar 2015

Research output: Patent

2015

Multi-layered structure for an EUV Mirror

Medvedev, V., Yakshin, A., Krivtsun, V. M. & Bijkerk, F., 30 Apr 2015, (Submitted) Patent No. PCT/EP2014/070877, Priority date 30 Sep 2014, Priority No. 10 2013 221 550.9

Research output: Patent

2014

Method for producing a reflective optical element for EUV-lithography

Kuznetsov, A., Gleeson, M. A., van de Kruijs, R. W. E. & Bijkerk, F., 10 Jul 2014, (In preparation) Patent No. 14/137,225, Priority date 20 Dec 2013, Priority No. 10 2011 077 983.3

Research output: Patent

Optical element comprising a multilayer coating, and optical arrangement comprising same

van de Kruijs, R. W. E., Nyabero, S. L., Yakshin, A. & Bijkerk, F., 6 Nov 2014, (Submitted) Patent No. PCT/EP2014/057637, Priority date 6 Nov 2014, Priority No. 10 2013 207 751.3 29 April 2013 (29.04.2013) DE

Research output: Patent

2012

Spectral filter for splitting a beam with electromagnetic radiation having wavelengths in the extreme ultraviolet (EUV) or soft X-Ray (Soft X) and the infrared (IR) wavelength range

van Goor, F. A., Bijkerk, F., van den Boogaard, T. & van der Meer, R., 23 Feb 2012, (Submitted) Patent No. WO 2012/023853 A1, Priority date 23 Feb 2012

Research output: Patent

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2011

Multilayer mirror

Krivtsun, V. M., Yakunin, A. M. & Medvedev, V., 26 May 2011, (In preparation) Patent No. PCT/EP2010/065155, Priority date 20 Nov 1999

Research output: Patent

Verfahren zur Herstellung eines reflektiven optischen Elements für die EUV-Lithographie

Kuznetsov, A., Gleeson, M., van de Kruijs, R. W. E. & Bijkerk, F., 2011, (In preparation) Patent No. DE 10 2011 077 983A1, Priority date 27 Apr 2011

Research output: Patent

2010

Method for manufacturing a multilayer structure with a lateral pattern for application in the XUV wavelength range, and BF and LMAG structures manufactured according to this method

Bijkerk, F., van der Wiel, W. G., van der Meer, R. & Hegeman, P. E., 2010, (Submitted) Patent No. 10769182.3, Priority No. NL20092003950 20091211, WO2010NL50832 20101208

Research output: Patent

Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby

Koshelev, K. N., Bijkerk, F., Zukavishvili, G. G., Korop, E. D. & Ivanov, V. V., 2010, (In preparation) Patent No. US20060600340 20061116, Priority date 3 Jul 2000, Priority No. EP20000202304 20000703, US20060600340 20061116

Research output: Patent

Reflective element for EUV lithography device

Yakshin, A., van de Kruijs, R. W. E., Bijkerk, F., Louis, E. & Nedelcu, I., 2010, (Submitted) Patent No. US20090536251 20090805, Priority date 5 Aug 2009

Research output: Patent

Reflektives optisches Element und Verfahren zu seiner Herstellung/ Method to enhance layer contrast of a multilayer for reflection at the B absorption edge

Tsarfati, T., Zoethout, E., Louis, E. & Bijkerk, F., 2010, (Submitted) Patent No. # US 61/079307 (US); # DE102008040265 (Germany), Priority date 30 May 2009

Research output: Patent