Alexey Y. Kovalgin

19982019
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Research Output 1998 2019

4 Citations (Scopus)
2 Downloads (Pure)

Van der Waals integration of silicene and hexagonal boron nitride

Wiggers, F. B., Fleurence, A., Aoyagi, K., Yonezawa, T., Yamada-Takamura, Y., Feng, H., Zhuang, J., Du, Y., Kovalgin, A. Y. & de Jong, M. P., 5 Apr 2019, In : 2D Materials. 6, 3, 035001.

Research output: Contribution to journalArticleAcademicpeer-review

Boron nitride
boron nitrides
Electronic properties
Silicon
electronics
6 Citations (Scopus)

Ultra-Thin Atomic Layer Deposited TiN Films: Non-Linear I–V Behaviour and the Importance of Surface Passivation

Van Hao, B., Aarnink, A. A. I., Kovalgin, A. Y. & Wolters, R. A. M., 1 Sep 2011, In : Journal of nanoscience and nanotechnology. 11, 9, p. 8120-8125 6 p.

Research output: Contribution to journalArticleAcademicpeer-review

Top-down meets bottom-up: nano-engineering for link between nm-and mu-scale

Kim, G. M., Kim, B. J., Holleman, J., Huskens, J., ten Have, E. S., Kovalgin, A. Y., Liebau, M., Reinhoudt, D., van Hulst, N. F. & Brugger, J., 19 Jun 2002, p. 71-78.

Research output: Contribution to conferencePaperAcademic

TiN films by Atomic Layer Deposition: Growth and electrical characterization down to sub-nm thickness

Bui, H. V., Wolters, R. A. M. & Kovalgin, A. Y., 14 Dec 2012, Anvanced Materials and Nanotechnology: International Conference Proceedings, 13-14th December 2012, Hanoi - Vietnam. Hoa, V. B. (ed.). Hanoi, Vietnam: Hanoi University of Science and Technology, p. 7-12 6 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

atomic layer epitaxy
electrical resistivity
film thickness
conduction electrons
surface reactions

Three-dimensional IC's prolong the life of Moore's law

Brunets, I., Boogaard, A., Isai, I. G., Aarnink, A. A. I., Kovalgin, A. Y., Holleman, J. & Schmitz, J., 17 Nov 2005, Proceedings of 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005. Veldhoven, The Netherlands: STW, p. 76-78 3 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Three-dimensional IC's prolong the life of Moore's law

Brunets, I., Boogaard, A., Isai, I. G., Aarnink, A. A. I., Kovalgin, A. Y., Holleman, J. & Schmitz, J., Nov 2005, p. 76-78. 3 p.

Research output: Contribution to conferencePaperAcademic

Thin-film antifuses for pellistor type gas sensors

Kovalgin, A. Y., Holleman, J., van den Berg, A. & Wallinga, H., 30 Nov 2001, Proceedings of Semiconductor Sensor and Actuator Technology SeSens 2001. Utrecht, The Netherlands: STW, p. 809-812 4 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

53 Downloads (Pure)

Thermal Atomic Layer Deposition of Polycrystalline Gallium Nitride

Banerjee, S., Aarnink, A. A. I., Gravesteijn, D. J. & Kovalgin, A. Y., 6 Sep 2019, In : Journal of physical chemistry C. 123, 37, p. 23214-23225 12 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Gallium nitride
Atomic layer deposition
gallium nitrides
atomic layer epitaxy
adducts

Thermal atomic layer deposition and oxidation of TiN monitored by in-situ spectroscopic ellipsometry

Van Hao, B., Aarnink, A. A. I., Kovalgin, A. Y., Wolters, R. A. M. & Schmitz, J., 26 Nov 2009, Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors. Utrecht, the Netherlands: STW, p. 59-62 4 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

314 Downloads (Pure)

Thermal and plasma-enhanced oxidation of ALD TiN

Groenland, A. W., Brunets, I., Boogaard, A., Aarnink, A. A. I., Kovalgin, A. Y. & Schmitz, J., 27 Nov 2008, Proceedings of the 11th annual workshop on semiconductor advances for future electronics and sensors (SAFE 2008). Utrecht, The Netherlands: STW, p. 468-471 4 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

File
4 Citations (Scopus)
49 Downloads (Pure)

The impact of deuterated CMOS processing on gate oxide reliability

Hof, A. J., Hoekstra, E., Kovalgin, A. Y., van Schaijk, R., Baks, W. M. & Schmitz, J., 1 Jun 2005, In : IEEE transactions on electron devices. 52, 9, p. 2111-2115 5 p.

Research output: Contribution to journalArticleAcademicpeer-review

Deuterium
Oxides
Processing
Degradation
Hot carriers
20 Downloads (Pure)

TFTs as photodetectors for optical interconnects

Rangarajan, B., Brunets, I., Holleman, J., Kovalgin, A. Y. & Schmitz, J., 26 Nov 2009, Proceedings of the 12th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors. Utrecht, The Netherlands: STW, p. 52-54 3 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

File
71 Citations (Scopus)
144 Downloads (Pure)

Systematic TLM Measurements of NiSi and PtSi Specific Contact Resistance to n- and p-Type Si in a Broad Doping Range

Stavitski, N., van Dal, M. J. H., Lauwers, A., Vrancken, C., Kovalgin, A. Y. & Wolters, R. A. M., 1 Apr 2008, In : IEEE electron device letters. 29, 4952/4, p. 378-381 4 p., 10.1109/LED.2008.917934.

Research output: Contribution to journalArticleAcademicpeer-review

File

Specific Contact Resistance Measurements of Metal-Semiconductor Junctions

Stavitski, N., van Dal, M. J. H., Wolters, R. A. M., Kovalgin, A. Y. & Schmitz, J., 17 Nov 2005, Proceedings of 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005. Veldhoven, The Netherlands: STW, p. 52-55 4 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

Specific contact resistance measurements of metal-semiconductor junctions

Stavitski, N., van Dal, M. J. H., Wolters, R. A. M., Kovalgin, A. Y. & Schmitz, J., Nov 2005, p. 52-55. 4 p.

Research output: Contribution to conferencePaperAcademic

9 Citations (Scopus)
2762 Downloads (Pure)

Specific Contact Resistance Measurements of Metal Semiconductor-Junctions

Stavitski, N., van Dal, M. J. H., Wolters, R. A. M., Kovalgin, A. Y. & Schmitz, J., 6 Mar 2006, Proceedings of the IEEE International Conference on Microelectronic Test Structures (ICMTS). Austin, TX, USA: IEEE, p. 13-17 5 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

File
39 Downloads (Pure)

Simulation of a Nanolink Hot-Plate Device

Groenland, A. W., Kovalgin, A. Y., Holleman, J. & Schmitz, J., 29 Nov 2007, 10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors (SAFE). Utrecht, The Netherlands: STW, p. 581-583 3 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

File
2 Citations (Scopus)

Silicon LEDs with antifuse injection

Piccolo, G., Hoang, T., Holleman, J., Kovalgin, A. Y. & Schmitz, J., 17 Sep 2008, 5th IEEE International Conference on Group IV Photonics, 2008. Piscataway: IEEE Computer Society Press, p. 49-51 3 p. 10.1109/GROUP4.2008.4638093

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

18 Downloads (Pure)

Semiconductor processing apparatus with compact free radical source

Kovalgin, A. Y. & Aarnink, A. A. I., 19 Dec 2013, Patent No. US2013337653 (A1), Priority date 14 Jun 2013

Research output: Patent

File

Semiconductor Devices - The Smell of Fear

Kovalgin, A. Y., Iordache, G., Holleman, J. & Jenneboer, A. J. S. M., 2 Oct 2003, p. -.

Research output: Contribution to conferencePosterOther research output

20 Citations (Scopus)

Self-limiting growth and thickness- and temperature-dependence of optical constants of ALD AlN thin films

Van Bui, H., Nguyen, M. D., Wiggers, F. B., Aarnink, A. A. I., de Jong, M. P. & Kovalgin, A. Y., 20 Feb 2014, In : ECS journal of solid state science and technology. 3, 4, p. P101-P106 6 p.

Research output: Contribution to journalArticleAcademicpeer-review

Optical constants
Atomic layer deposition
Thin films
Temperature
Spectroscopic ellipsometry
1 Citation (Scopus)
1 Downloads (Pure)

Selenidation of epitaxial silicene on ZrB2

Wiggers, F. B., Yamada-Takamura, Y., Kovalgin, A. Y. & de Jong, M. P., 15 Jan 2018, In : Applied surface science. 428, p. 793-797 5 p.

Research output: Contribution to journalArticleAcademicpeer-review

2 Downloads (Pure)

Selective deposition of Tungsten

Kovalgin, A. Y., Yang, M., Aarnink, A. A. I. & Wolters, R. A. M., 25 Jan 2018, Patent No. US 2018/0025939 A1, Priority date 6 Jun 2017, Priority No. 15/615,489

Research output: Patent

Tungsten
Hydrogen
Substrates
Metals
Wire

Room Temperature SiO2 Films Deposited by Multipolar ECR PECVD

Isai, I. G., Kovalgin, A. Y., Holleman, J., Woerlee, P. H. & Wallinga, H., 2001, In : Journal de physique IV. 11, Pr3, p. 747-753

Research output: Contribution to journalConference articleAcademicpeer-review

Electron cyclotron resonance
Plasma enhanced chemical vapor deposition
electron cyclotron resonance
room temperature
Temperature

Room Temperature SiO2 films by Multipolar ECR PECVD

Isai, I. G., Kovalgin, A. Y., Holleman, J., Woerlee, P. H. & Wallinga, H., 2001.

Research output: Contribution to conferencePosterAcademic

18 Citations (Scopus)

Replication molds having nanometer-scale shape control fabricated by means of oxidation and etching

Kim, G. M., Kovalgin, A. Y., Holleman, J. & Brugger, J. P., 1 Feb 2002, In : Journal of nanoscience and nanotechnology. 2, 1, p. 55-59 5 p., 10.1166/jnn.2002.073.

Research output: Contribution to journalArticleAcademicpeer-review

Realization of Silicon-Nanodots-Based CMOS Backend-Compatible Electrical SPP Source

Brunets, I., Walters, R. J., Kovalgin, A. Y., Polman, A. & Schmitz, J., 1 May 2011, 219th ECS Meeting. Pennington, NJ, USA: Electro Chemical Society, p. MA2011-01 4 p. (Meeting Abstracts; vol. MA2011-01).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

4 Citations (Scopus)

Poly-Si stripe TFTs by Grain-Boundary controlled crystallization of Amorphous-Si

Brunets, I., Holleman, J., Kovalgin, A. Y. & Schmitz, J., 15 Sep 2008, Proceedings of the 38th European Solid-State Device Research Conference. Edinburgh, Schotland: IOP Institute of Physics, p. 87-90 4 p. 10.1109/ESSDERC.2008.4681705

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Physical properties of silicon oxide layers deposited at room temperature by a combination of ECR plasma and high-speed jet of silane

Isai, I. G., Kovalgin, A. Y., Holleman, J., Wallinga, H., Woerlee, P. H., Cobianu, C. & Modreanu, M., 1 Apr 2003, Proceedings of Chemical Vapor Deposition XVI and EUROCVD 14. The Electrochemical Society Inc., p. 609-616 7 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

9 Citations (Scopus)
1 Downloads (Pure)

PEALD AlN: Controlling growth and film crystallinity

Banerjee, S., Aarnink, A. A. I., van de Kruijs, R. W. E., Kovalgin, A. Y. & Schmitz, J., 10 Jun 2015, In : Physica status solidi. C. 12, 7, p. 1036-1042 7 p.

Research output: Contribution to journalArticleAcademicpeer-review

Optical and Electrical Characterization of SiO2 films deposited at low temperature by means of remote ICPECVD

Boogaard, A., Kovalgin, A. Y., Brunets, I., Holleman, J. & Schmitz, J., 29 Nov 2007, Proceedings of the 10th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors. Utrecht, The Netherlands: STW, p. 404-407 4 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

3 Citations (Scopus)

On the verification of EEDFs in plasmas with silane using optical emission spectroscopy

Boogaard, A., Ozturk, M. (ed.), Gusev, E. (ed.), Kovalgin, A. Y., Brunets, I., Iwai, H. (ed.), Aarnink, A. A. I., Koester, S. (ed.), Wolters, R. A. M., Kwong, D. (ed.), Holleman, J., Roozeboom, F. (ed.), Timans, P. (ed.) & Schmitz, J., 2007, In : ECS transactions. 6, 7/1, p. 259-270 12 p., 10.1149/1.2727409.

Research output: Contribution to journalArticleAcademicpeer-review

2 Citations (Scopus)

On the oxidation kinetics of silicon in ultradiluted H2O and D2O ambient

Hof, A. J., Kovalgin, A. Y., Woerlee, P. H. & Schmitz, J., 28 Jul 2005, In : Journal of the Electrochemical Society. 152, 9, p. F133-F137 5 p.

Research output: Contribution to journalArticleAcademicpeer-review

201 Downloads (Pure)

On the leakage problem of MIM capacitors due to improper etching of titanium nitride

Groenland, A. W., Wolters, R. A. M., Kovalgin, A. Y. & Schmitz, J., 18 Nov 2010, Proceedings of STW.ICT Conference 2010. Utrecht: STW, p. 89-92 4 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

File
1 Citation (Scopus)

On the growth of native oxides on hydrogen-terminated silicon surfaces in dark and under illumination with light

Kovalgin, A. Y., Zinine, A., Bankras, R., Wormeester, H., Poelsema, B. & Schmitz, J., 29 Oct 2006, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 2: New Materials, Processes, and Equipment. Roozeboom, F., Kwong, D-L., Iwai, H., Öztürk, M. C., Timans, P. J. & Gusev, E. (eds.). Pennington, N.J.: The Electrochemical Society Inc., p. 191-202 12 p. (ECS Transactions; vol. 3, no. 2).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

illumination
oxides
silicon
hydrogen
cleaning

On the Feasibilty of Using Antifuses as Low-power Heating/Detecting Elements in Pellistor-type Gas Sensors

Kovalgin, A. Y., Holleman, J. & van den Berg, A., 14 May 2001, p. -.

Research output: Contribution to conferencePosterOther research output

On the feasibility of using Antifuses as Low-Power Heating/Detecting Elements in Pellistor-Type Gas Sensors

Kovalgin, A. Y., Holleman, J. & van den Berg, A., 14 May 2001, Sensor Technology 2001. Enschede, the Netherlands, p. 107-112 6 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

7 Citations (Scopus)

On the feasibility of silicene encapsulation by AlN deposited using an atomic layer deposition process

Van Hao, B., Wiggers, F. B., Friedlein, R., Yamada-Takamura, Y., Kovalgin, A. Y. & de Jong, M. P., 9 Feb 2015, In : Journal of chemical physics. 142, p. 064712 5 p.

Research output: Contribution to journalArticleAcademicpeer-review

15 Downloads (Pure)

On the effect of nano-injectors on conduction in silicon p-i-n diodes

Piccolo, G., Kovalgin, A. Y. & Schmitz, J., 18 Nov 2010, Proceedings of STW.ICT Conference 2010. Utrecht: STW, p. 140-142 3 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

File
33 Citations (Scopus)

On the difference between optically and electrically determined resistivity of ultra-thin titanium nitride films

Van Hao, B., Kovalgin, A. Y. & Wolters, R. A. M., 15 Mar 2013, SURFINT-SREN III. Amsterdam: Elsevier, p. 45-49 5 p. (Applied Surface Science; vol. 269).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

4 Downloads (Pure)

On Oxidation of Silicon in Ultra-Diluted H2O and D2O Ambient

Hof, A. J., Kovalgin, A. Y. & Schmitz, J., 27 Jun 2004, proceedings Wodim 2004. Cork, Ireland, p. -

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

File

On Oxidation Kinetics and Electrical Quality of Gate Oxide Grown in H2O or D2O Ambient

Hof, A. J., Kovalgin, A. Y., Woerlee, P. H. & Schmitz, J., 25 Nov 2003, Proceedings of Semiconductor Advances for Future Electronics SAFE 2003. p. 743-747 5 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

On oxidation kinetics and electrical quality of gate oxide grown in H2O or D2O ambient

Hof, A. J., Kovalgin, A. Y., Woerlee, P. H. & Schmitz, J., 25 Nov 2003, p. 743-747. 5 p.

Research output: Contribution to conferencePaperAcademic

On Gas-Phase Depletion During LPCVD of GeSi Films using GeH4/SiH4 and GeH4/Si2H6 Gas Sources

Kovalgin, A. Y. & Holleman, J., 2003, Thin Film Transistor Technologies VI: proceedings of the international symposium. Kuo, Y. (ed.). Pennington, NJ: The Electrochemical Society Inc., p. 216-223 8 p. (Proceedings; no. 2002-23).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

8 Citations (Scopus)

Net Negative Charge in low-temperature SiO2 gate dielectric layers

Boogaard, A., Kovalgin, A. Y. & Wolters, R. A. M., 23 Apr 2009, In : Microelectronic engineering. 86, 7-9, p. 1707-1710 4 p., 10.1016/j.mee.2009.03.124.

Research output: Contribution to journalArticleAcademicpeer-review

5 Citations (Scopus)

Negative Charge in Plasma Oxidized SiO2 Layers

Boogaard, A., Kovalgin, A. Y. & Wolters, R. A. M., 1 Jul 2011, 219th ECS Meeting. USA: The Electrochemical Society Inc., p. 259-272 14 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Nano-scale hotspots: a route to fast, real time and reliable gas sensing

Kovalgin, A. Y., Akil, N. A., Le Minh, P., Holleman, J., van den Berg, A., Houtsma, V. E. & Wallinga, H., 1 Dec 2000, Proceedings of STW/SeSence 2000. Veldhoven, The Netherlands: STW, p. 651-654

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2 Citations (Scopus)
1 Downloads (Pure)

Nanoscale carrier injectors for high luminescence Si-based LEDs

Piccolo, G., Kovalgin, A. Y. & Schmitz, J., 27 Apr 2012, In : Solid-state electronics. 74, Special Issue, Selected Papers from the ESSDERC 2011 Conference, p. 43-48 6 p.

Research output: Contribution to journalArticleAcademicpeer-review

Nanoscale Antifuses/Hotspots for Novel Sensing Concepts

Le Minh, P., Kovalgin, A. Y., Holleman, J., Woerlee, P. H., van den Berg, A. & Wallinga, H., 12 Nov 2001, p. -.

Research output: Contribution to conferencePosterOther research output

Nanometer-scale Hot Spots & Light Emitting Antifuses

Le Minh, P., Kovalgin, A. Y., Akil, N. A., Woerlee, P. H., van den Berg, A., Wallinga, H. & Holleman, J., 12 Oct 2000, Enschede, The Netherlands

Research output: Other contributionOther research output