Alexey Y. Kovalgin

19982019
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Research Output 1998 2019

2000

High quality, Room temperature Gate Dielectrics for TFTs

Isai, I. G., Kovalgin, A. Y., Holleman, J., Woerlee, P. H. & Wallinga, H., 29 Nov 2000, Proceedings of SAFE conference 2000. Veldhoven, The Netherlands, p. 69-74

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

High Quality Silicon Oxide Deposited with a Multipolar Electron Cyclotron Resonance Plasma Source

Isai, I. G., Kovalgin, A. Y., Holleman, J., Woerlee, P. H. & Wallinga, H., 22 Oct 2000, Proceedings of the 198th Meeting of the Electrochemical Society. Phoenix, USA, p. -

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Low-pressure CVD of Germanium-Silicon films using silane and germane sources

Kovalgin, A. Y., Holleman, J., Salm, C. & Woerlee, P. H., 22 Oct 2000, Proceedings of the 198th Meeting of the Electrochemical Society. Phoenix, USA, p. -

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Low Temperature SiO2 films deposited by Multipolar ECR PECVD

Isai, I. G., Kovalgin, A. Y., Holleman, J., Dekker, R., Woerlee, P. H. & Wallinga, H., 19 Dec 2000, Veldhoven, The Netherlands

Research output: Other contributionOther research output

Nanometer-scale Hot Spots & Light Emitting Antifuses

Le Minh, P., Kovalgin, A. Y., Akil, N. A., Woerlee, P. H., van den Berg, A., Wallinga, H. & Holleman, J., 12 Oct 2000, Enschede, The Netherlands

Research output: Other contributionOther research output

Nano-scale hotspots: a route to fast, real time and reliable gas sensing

Kovalgin, A. Y., Akil, N. A., Le Minh, P., Holleman, J., van den Berg, A., Houtsma, V. E. & Wallinga, H., 1 Dec 2000, Proceedings of STW/SeSence 2000. Veldhoven, The Netherlands: STW, p. 651-654

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1999

Characterisation of Silicon Oxide films deposited by means of ECR PECVD

Kovalgin, A. Y., Isai, I. G., Holleman, J., Dekker, R., Woerlee, P. H. & Wallinga, H., 24 Nov 1999, SAFE'99. Mierlo, The Netherlands, p. 239-246 8 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Dielectric thin films deposited by means of ECR PECVD

Isai, I. G., Kovalgin, A. Y., Holleman, J., Dekker, R., Woerlee, P. H. & Wallinga, H., 21 Dec 1999, Veldhoven, The Netherlands

Research output: Other contributionOther research output

Grouwth and properties of IC dielectrics

Kovalgin, A. Y., Isai, I. G., Wang, Z., Houtsma, V. E., Holleman, J., Dekker, R., Salm, C., Woerlee, P. H. & Mouthaan, A. J., 14 Oct 1999, Enschede, The Netherlands

Research output: Other contributionOther research output

1998

A Study of LPCVD of Germanium-Silicon Alloys

Kovalgin, A. Y. & Holleman, J., 1998, University of Twente: Geen opgaven. 119 p.

Research output: Book/ReportReportProfessional

LPCVD of GexSi1-x films using SiH4 and GeH4 source gases

Kovalgin, A. Y., Holleman, J., Salm, C., Woerlee, P. H. & Ponomarev, Y. V., 26 Jun 1998, Enschede, the Netherlands

Research output: Other contributionOther research output

LPCVD of GeXSi1-x Films Using SiH4 and GeH4 Source Gases

Kovalgin, A. Y., Holleman, J., Salm, C., Woerlee, P. H. & Ponomarev, Y. V., 26 Nov 1998, Proceedings of the SAFE'98. Mierlo, the Netherlands, p. 311-317 7 p.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review