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Research Output 1998 2019

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Other contribution
2000

Low Temperature SiO2 films deposited by Multipolar ECR PECVD

Isai, I. G., Kovalgin, A. Y., Holleman, J., Dekker, R., Woerlee, P. H. & Wallinga, H., 19 Dec 2000, Veldhoven, The Netherlands

Research output: Other contributionOther research output

Nanometer-scale Hot Spots & Light Emitting Antifuses

Le Minh, P., Kovalgin, A. Y., Akil, N. A., Woerlee, P. H., van den Berg, A., Wallinga, H. & Holleman, J., 12 Oct 2000, Enschede, The Netherlands

Research output: Other contributionOther research output

1999

Dielectric thin films deposited by means of ECR PECVD

Isai, I. G., Kovalgin, A. Y., Holleman, J., Dekker, R., Woerlee, P. H. & Wallinga, H., 21 Dec 1999, Veldhoven, The Netherlands

Research output: Other contributionOther research output

Grouwth and properties of IC dielectrics

Kovalgin, A. Y., Isai, I. G., Wang, Z., Houtsma, V. E., Holleman, J., Dekker, R., Salm, C., Woerlee, P. H. & Mouthaan, A. J., 14 Oct 1999, Enschede, The Netherlands

Research output: Other contributionOther research output

1998

LPCVD of GexSi1-x films using SiH4 and GeH4 source gases

Kovalgin, A. Y., Holleman, J., Salm, C., Woerlee, P. H. & Ponomarev, Y. V., 26 Jun 1998, Enschede, the Netherlands

Research output: Other contributionOther research output