• 795 Citations
  • 16 h-Index
20062020
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Research Output 2006 2020

2019
Open Access
Graphite
Optical sensors
optical measuring instruments
Graphene
Etching
1 Downloads (Pure)

Etching processes of transferred and non-transferred multi-layer graphene in the presence of extreme UV, H2O and H2

Mund, B. K., Sturm, J. M., van den Beld, W. T. E., Lee, C. J. & Bijkerk, F., 29 Oct 2019, In : Applied surface science. 504, 144485.

Research output: Contribution to journalArticleAcademicpeer-review

Graphite
Graphene
Etching
graphene
etching
26 Downloads (Pure)

Extreme UV secondary electron yield measurements of Ru, Sn, and Hf oxide thin films

Sturm, J. M., Liu, F., Darlatt, E., Kolbe, M., Aarnink, A. A. I., Lee, C. J. & Bijkerk, F., 1 Jul 2019, In : Journal of Micro/ Nanolithography, MEMS, and MOEMS. 18, 3, 033501.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Oxide films
Thin films
oxides
Electrons
thin films

Hydrogenation dynamics of Ru capped y thin films

Soroka, O., Sturm, J. M., Van De Kruijs, R. W. E., Makhotkin, I. A., Nikolaev, K., Yakunin, S. N., Lee, C. J. & Bijkerk, F., 8 Oct 2019, In : Journal of applied physics. 126, 14, 145301.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
hydrogenation
thin films
ellipsometry
hydrogen
surface plasmon resonance
2018
2 Citations (Scopus)
10 Downloads (Pure)

Aromatic structure degradation of single layer graphene on an amorphous silicon substrate in the presence of water, hydrogen and Extreme Ultraviolet light

Mund, B. K., Sturm, J. M., Lee, C. J. & Bijkerk, F., 1 Jan 2018, In : Applied surface science. 427, Part B, p. 1033-1040 8 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Graphite
Amorphous silicon
Graphene
Hydrogen
Degradation
2 Citations (Scopus)
11 Downloads (Pure)

Control of YH3 formation and stability via hydrogen surface adsorption and desorption

Soroka, O., Sturm, J. M., van de Kruijs, R. W. E., Lee, C. J. & Bijkerk, F., 15 Oct 2018, In : Applied surface science. 455, p. 70-74 5 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Hydrogen
Desorption
Adsorption
Yttrium
Thin films
1 Citation (Scopus)
12 Downloads (Pure)

Formation of H2O on a CO2 dosed Ru(0 0 0 1) surface under Extreme Ultraviolet Light and H2

Mund, B. K., Sturm, J. M., Lee, C. J. & Bijkerk, F., 31 Oct 2018, In : Applied surface science. 456, p. 538-544 7 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Amorphous carbon
Temperature programmed desorption
Absorption spectroscopy
Reaction products
Carbon Dioxide

Formation of H2O on the surface of CO2 dosed Ru(0001) under Extreme Ultraviolet Light and H2

Mund, B. K., Pachecka, M., Sturm, J. M., Lee, C. J. & Bijkerk, F., Jan 2018.

Research output: Contribution to conferencePoster

Hydrogen diffusion measurements using Y thin film monitoring

Soroka, O., Sturm, J. M., Lee, C. J. & Bijkerk, F., Jan 2018.

Research output: Contribution to conferencePoster

2 Citations (Scopus)
12 Downloads (Pure)

Influence of internal stress and layer thickness on the formation of hydrogen induced thin film blisters in Mo/Si multilayers

van den Bos, R. A. J. M., Reinink, J., Lopaev, D. V., Lee, C. J., Benschop, J. P. H. & Bijkerk, F., 22 Feb 2018, In : Journal of physics D: applied physics. 51, 11, 11 p., 115302.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
blisters
residual stress
Hydrogen
Residual stresses
Multilayers
92 Downloads (Pure)

Plasma-assisted oxide removal from ruthenium-coated EUV optics

Dolgov, A., Lee, C. J., Bijkerk, F., Abrikosov, A., Krivtsun, V. M., Lopaev, D., Yakushev, O. & van Kampen, M., 18 Apr 2018, In : Journal of applied physics. 123, 15, 9 p., 153301.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
ruthenium
hydrogen plasma
optics
cold plasmas
oxides
2017
7 Citations (Scopus)
48 Downloads (Pure)

Adsorption and Dissociation of CO2 on Ru (0001)

Pachecka, M., Sturm, J. M., Lee, C. J. & Bijkerk, F., 30 Mar 2017, In : Journal of physical chemistry. p. 6729-6735 7 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Carbon Monoxide
Temperature programmed desorption
Infrared spectroscopy
desorption
infrared spectroscopy

A model for hydrogen induced blister growth in Mo/Si multilayer mirror structures

van den Bos, R., Benschop, J., Bijkerk, F. & Lee, C. J., 17 Jan 2017.

Research output: Contribution to conferencePoster

9 Citations (Scopus)
2 Downloads (Pure)

Blister formation in Mo/Si multilayered structures induced by hydrogen ions

Van Den Bos, R. A. J. M., Lee, C. J., Benschop, J. P. H. & Bijkerk, F., 9 Jun 2017, In : Journal of physics D: applied physics. 50, 26, 265302.

Research output: Contribution to journalArticleAcademicpeer-review

blisters
hydrogen ions
Protons
Ions
Fluxes
4 Citations (Scopus)
33 Downloads (Pure)

Characterization of self-assembled monolayers on a ruthenium surface

Shaheen, A., Sturm, J. M., Ricciardi, R., Huskens, J., Lee, C. J. & Bijkerk, F., 6 Jun 2017, In : Langmuir. 33, 25, p. 6419-6429 8 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Ruthenium
Self assembled monolayers
ruthenium
Monolayers
sulfur
2 Citations (Scopus)
1 Downloads (Pure)

Coexistence of ice clusters and liquid-like water clusters on the Ru(0001) surface

Liu, F., Sturm, J. M., Lee, C. J. & Bijkerk, F., 2017, In : Physical chemistry chemical physics. 19, 12, p. 8288-8299 12 p.

Research output: Contribution to journalArticleAcademicpeer-review

Ice
ice
Water
Liquids
liquids
2 Citations (Scopus)
104 Downloads (Pure)

Metal diffusion properties of ultra-thin high-k Sc2O3 films

Pachecka, M., Lee, C. J., Sturm, J. M. & Bijkerk, F., 1 Oct 2017, In : AIP advances. 7, 10, 21 p., 105324.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
metals
tin
etching
ruthenium
adhesion
1 Citation (Scopus)
132 Downloads (Pure)

Tin etching from metallic and oxidized scandium thin films

Pachecka, M., Lee, C. J., Sturm, J. M. & Bijkerk, F., Aug 2017, In : AIP advances. 7, 8, 8 p., 085107.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
scandium
tin
etching
oxides
thin films
43 Citations (Scopus)
106 Downloads (Pure)

Two-octave spanning supercontinuum generation in stoichiometric silicon nitride waveguides pumped at telecom wavelengths

Garcia Porcel, M. A., Schepers, F., Epping, J. P., Hellwig, T., Hoekman, M., Heideman, R., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Fallnich, C. & Boller, K. J., 19 Jan 2017, In : Optics express. 25, 2, p. 1542-1554

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
octaves
silicon nitrides
waveguides
telecommunication
output

Visible to mid-infrared supercontinuum generation in disperion engineered stoichiometric silicon nitride waveguides drive by 120-fs, 1560-nm laser pulses

Garcia Porcel, M. A., Schepers, F., Epping, J. P., Hellwig, T., Hoekman, M., Heideman, R., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Fallnich, C. & Boller, K. J., 17 Jan 2017, p. -.

Research output: Contribution to conferencePoster

Visible to mid-infrared supercontinuum generation in dispersion engineered stoichiometric silicon nitride waveguides driven by 120-fs, 1560-nm laser pulses

Garcia Porcel, M. A., Schepers, F., Epping, J. P., Hoekman, M., Heideman, R., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Fallnich, C. & Boller, K. J., 17 Jan 2017, p. -.

Research output: Contribution to conferencePoster

2016
9 Citations (Scopus)
55 Downloads (Pure)

A model for pressurized hydrogen induced thin film blisters

van den Bos, R. A. J. M., Reshetniak, V., Lee, C. J., Benschop, J. P. H. & Bijkerk, F., 2016, In : Journal of applied physics. 120, 23, p. 235304- 8 p., 235304.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
blisters
hydrogen
thin films
caps
internal pressure

Elastic modulus of extreme ultraviolet exposed single layer graphene

Mund, B. K., Gao, A., Sturm, J. M., Lee, C. J. & Bijkerk, F., 19 Jan 2016, p. -.

Research output: Contribution to conferencePoster

modulus of elasticity
graphene
optics
membranes
photomasks
7 Citations (Scopus)
42 Downloads (Pure)

Electronegativity-dependent tin etching from thin films

Pachecka, M., Sturm, J. M., van de Kruijs, R. W. E., Lee, C. J. & Bijkerk, F., 29 Jul 2016, In : AIP advances. 6, 7, 9 p., 075222.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
tin
etching
thin films
hydrogen
availability
16 Citations (Scopus)

Exploring the electron density in plasma induced by EUV radiation: I. Experimental study in hydrogen

Horst, R. M., Beckers, J., Osorio, E. A., Astakhov, D., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsum, V. M., Koshelev, K. N. & Lopaev, D. V., 2016, In : Journal of physics D: applied physics. 49, 14, p. - 8 p., 145203.

Research output: Contribution to journalArticleAcademicpeer-review

Carrier concentration
Hydrogen
Plasmas
Radiation
hydrogen
15 Citations (Scopus)

Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen

Astakhov, D., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsun, V. M., Koshelev, K. N., Lopaev, D. V., Horst, R. M., Beckers, J., Osorio, E. A. & Bijkerk, F., 2016, In : Journal of physics D: applied physics. 49, 29, p. - 9 p., 295204.

Research output: Contribution to journalArticleAcademicpeer-review

Argon
Carrier concentration
Hydrogen
argon
Plasmas
9 Citations (Scopus)

Extreme UV induced dissociation of amorphous solid water and crystalline water bilayers on Ru(0001)

Liu, F., Sturm, J. M., Lee, C. J. & Bijkerk, F., 2016, In : Surface science. 646, p. 101-107 7 p.

Research output: Contribution to journalArticleAcademicpeer-review

dissociation
water
desorption
cross sections
water loss

Hydrogen induced blister formation in multilayer mirror structures

van den Bos, R. A. J. M., Lee, C. J. & Bijkerk, F., 19 Jan 2016, p. -.

Research output: Contribution to conferencePoster

In-situ study of the YH2-YH3+x transition during hydrogenation by GI-DAFS and HAXPEX

Makhotkin, I. A., Soroka, O., Yakunin, S. N., Nikolaev, K., Hendrikx, S. P. & Lee, C. J., 2016, Grenoble: Universiteit Twente, XUV Optics. 3 p.

Research output: Book/ReportReportProfessional

5 Downloads (Pure)

Numerical and experimental studies of the carbon etching in EUV-induced plasma

Astakhov, D., Goedheer, W. J., Lee, C. J., Ivanov, V. V., Krivtsun, V. M., Yakushev, O., Koshelev, K. N., Lopaev, D. V. & Bijkerk, F., 2016, p. -, 11 p.

Research output: Working paper

Open Access
File
etching
carbon
ions
energy
hydrogen plasma

On-chip broadband supercontinuum generation at telecom wavelengths using silicon nitride waveguides

Garcia Porcel, M. A., Schepers, F., Epping, J. P., Hellwig, T., Hoekman, M., Leinse, A., Heideman, R., van Rees, A., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Fallnich, C. & Boller, K. J., 13 Dec 2016.

Research output: Contribution to conferencePoster

Reflectivity tuning through controlled hydrogenation

Lee, C. J. & Bijkerk, F., 27 Oct 2016, (Submitted) Patent No. P21855/de, Priority date 18 Aug 2016, Priority No. G02B 1/10 (2015/01)

Research output: Patent

Spectroscopic ellipsometry for H diffusion

Soroka, O., Jose, A. A., van de Kruijs, R. W. E., Bijkerk, F. & Lee, C. J., 3 Apr 2016, p. -.

Research output: Contribution to conferencePoster

Two-octave spanning on-chip supercontinuum generation at telecom wavelengths using silicon nitride waveguides

Garcia Porcel, M. A., Schepers, F., Epping, J. P., Hellwig, T., Hoekman, M., Leinse, A., Heideman, R., van Rees, A., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Fallnich, C. & Boller, K. J., 10 Oct 2016, p. -.

Research output: Contribution to conferencePoster

1 Citation (Scopus)

Ultra-broadband Supercontinuum Generation at Telecommunication Wavelengths in Dispersion Engineered Stoichiometric Si3N4 Waveguides

Schepers, F., Garcia Porcel, M. A., Epping, J. P., Hellwig, T., Hoekman, M., Mateman, R., Leinse, A., Heideman, R. G., van der Slot, P. J. M., Lee, C. J., Schmidt, R., Bratschitsch, R., Boller, K. J., Fallnich, C. & van Rees, A., 5 Jun 2016, Conference on Lasers and Electro-Optics. San Jose, California, USA: OSA Technical Digest, p. AM3J.5-

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

telecommunication
broadband
waveguides
wavelengths
pumps

Ultra-wideband supercontinuum generation in Si3N4-based waveguides

van der Slot, P. J. M., Epping, J. P., Hellwig, T., Hoekman, M., Leinse, A., Heideman, R., Mateman, R., van Rees, A., Lee, C. J., Fallnich, C. & Boller, K. J., 19 Jan 2016, p. -.

Research output: Contribution to conferencePoster

2015

Blister mechanism in extreme ultraviolet multilayer mirrors

van den Bos, R. A. J. M., Lee, C. J. & Bijkerk, F., 31 Aug 2015, p. -.

Research output: Contribution to conferencePoster

8 Citations (Scopus)

Characterization of carbon contamination under ion and hot atom bombardment in a tin-plasma extreme ultraviolet light source

Dolgov, A., Lopaev, D., Lee, C. J., Zoethout, E., Medvedev, V., Yakushev, O. & Bijkerk, F., 23 Jun 2015, In : Applied surface science. 353, p. 708-713 6 p.

Research output: Contribution to journalArticleAcademicpeer-review

Tin
Light sources
Contamination
Plasmas
Atoms

Elastic modulus of Extreme Ultraviolet exposed single-layer graphene

Mund, B. K., Gao, A., Sturm, J. M., Lee, C. J. & Bijkerk, F., 6 Sep 2015, p. -.

Research output: Contribution to conferencePoster

modulus of elasticity
graphene
reticles
protective coatings
beam splitters

Elastic modulus of Extreme Ultraviolet exposed single-layer graphene

Mund, B. K., Gao, A., Sturm, J. M., Lee, C. J. & Bijkerk, F., 28 Sep 2015, p. -.

Research output: Contribution to conferencePoster

modulus of elasticity
graphene
reticles
protective coatings
beam splitters

Elastic modulus of Extreme Ultraviolet exposed single-layer graphene

Mund, B. K., Gao, A., Sturm, J. M., Lee, C. J. & Bijkerk, F., 31 Aug 2015, p. -.

Research output: Contribution to conferencePoster

modulus of elasticity
graphene
reticles
protective coatings
beam splitters

Electonegativity-dependent cleaning of tin from different surface materials

Pachecka, M., Sturm, J. M., Lee, C. J. & Bijkerk, F., 20 Jan 2015, p. -.

Research output: Contribution to conferencePoster

Electronegativity-dependent removal of tin from different surface materials

Pachecka, M., Sturm, J. M., Lee, C. J. & Bijkerk, F., 31 Aug 2015, p. -.

Research output: Contribution to conferencePoster

Electronegativity-dependent removal of tin from different surface materials

Pachecka, M., Sturm, J. M., Lee, C. J. & Bijkerk, F., 6 Sep 2015, p. -.

Research output: Contribution to conferencePoster

Electronegativity-dependent removal of tin from different surfact materials

Pachecka, M., Sturm, J. M., Lee, C. J. & Bijkerk, F., 28 Sep 2015, p. -.

Research output: Contribution to conferencePoster

EUV induced secondary electron emission on HfO2, SnO2 and Ru thin films

Liu, F., Sturm, J. M., Darlatt, E., Kolbe, M., Bijkerk, F. & Lee, C. J., 5 Nov 2015, p. -.

Research output: Contribution to conferencePoster

14 Citations (Scopus)

Extreme ultraviolet (EUV) source and ultra-high vacuum chamber for studying EUV-induced processes

Dolgov, A., Yakushev, O., Abrikosov, A., Snegirev, E., Krivtsun, V. M., Lee, C. J. & Bijkerk, F., 29 Apr 2015, In : Plasma sources science and technology. 24, 3, p. - 7 p., 035003.

Research output: Contribution to journalArticleAcademicpeer-review

vacuum chambers
ultrahigh vacuum
plasma radiation
plasma diagnostics
radiation sources
44 Citations (Scopus)
22 Downloads (Pure)

High confinement, high yield Si3N4 waveguides for nonlinear optical applications

Epping, J. P., Hoekman, M., Mateman, R., Leinse, A., Heideman, R. G., van Rees, A., van der Slot, P. J. M., Lee, C. J. & Boller, K-J., 26 Jan 2015, In : Optics express. 23, 2, p. 642-648

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
waveguides
fabrication
silicon nitrides
cracks
etching