Research output per year
Research output per year
Research output
Search results
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2016
EUV multilayer mirror, optical system including a multilayer mirror and method of manufacturing a multilayer mirror
Huang, Q., Louis, E., Bijkerk, F., de Boer, M. J. & von Blanckenhagen, G., 18 Aug 2016, (Submitted) Patent No. WO2015EP52767 20150210, Priority date 10 Feb 2015, Priority No. WO2015EP52767 20150210Research output: Patent
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2011
REFLECTIVE OPTICAL ELEMENT AND METHOD OF MANUFACTURING THE SAME
Tsarfati, T., Zoethout, E., Louis, E. & Bijkerk, F., 11 Aug 2011, IPC No. H05H 1/ 24 A I, Patent No. US2011194087, Priority date 7 Jan 2011, Priority No. US20110986856Research output: Patent
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2010
Reflective element for EUV lithography device
Yakshin, A., van de Kruijs, R. W. E., Bijkerk, F., Louis, E. & Nedelcu, I., 2010, (Submitted) Patent No. US20090536251 20090805, Priority date 5 Aug 2009Research output: Patent
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Reflektives optisches Element und Verfahren zu seiner Herstellung/ Method to enhance layer contrast of a multilayer for reflection at the B absorption edge
Tsarfati, T., Zoethout, E., Louis, E. & Bijkerk, F., 2010, (Submitted) Patent No. # US 61/079307 (US); # DE102008040265 (Germany), Priority date 30 May 2009Research output: Patent
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2004
Method for coating substrates and mask holder
Bijkerk, F., Yakshin, A., Louis, E., Kessels, M. J. H., Maas, E. L. G. & Bruineman, C., 18 Mar 2004, IPC No. C23C 16/ 04 A I, Patent No. US2004052942, Priority date 14 Dec 2001, Priority No. WO2001EP14728Research output: Patent
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2002
MULTI-LAYER MIRROR FOR RADIATION IN THE XUV WAVELENGHT RANGE AND METHOD FOR MANUFACTURE THEREOF
Bijkerk, F., Louis, E., Kessels, M. J. H., Verhoeven, J. & Den Hartog, H. M. J., 28 Nov 2002, IPC No. G21K 1/ 06 A I, Patent No. WO02095771, Priority date 23 May 2001, Priority No. NL20011018139Research output: Patent