Fred Bijkerk

prof.dr.

  • 1628 Citations
  • 21 h-Index
1994 …2020
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  • 9 Similar Profiles
mirrors Physics & Astronomy
reflectance Physics & Astronomy
wavelengths Physics & Astronomy
Multilayers Engineering & Materials Science
optics Physics & Astronomy
lithography Physics & Astronomy
thin films Physics & Astronomy
x rays Physics & Astronomy

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Research Output 1994 2020

Alternative EUV absorptive materials and novel architectures for EUV reticle in nm node technology scanner

Edrisi, A., 4 Mar 2019, Enschede: University of Twente. 80 p.

Research output: ThesisPd Eng ThesisAcademic

Open Access
File
scanners
silver
reticles
absorbers
nickel
103 Downloads (Pure)

Angular and spectral bandwidth of Extreme UV multilayers near spacer material absorption edges

Zameshin, A., Yakshin, A., Chandrasekaran, A. & Bijkerk, F., 1 Jan 2019, In : Journal of nanoscience and nanotechnology. 19, 1, p. 602-608 7 p.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
material absorption
Electric Power Supplies
Optical Devices
Synchrotrons
spacers
Open Access
Graphite
Optical sensors
optical measuring instruments
Graphene
Etching
1 Downloads (Pure)

Etching processes of transferred and non-transferred multi-layer graphene in the presence of extreme UV, H2O and H2

Mund, B. K., Sturm, J. M., van den Beld, W. T. E., Lee, C. J. & Bijkerk, F., 29 Oct 2019, In : Applied surface science. 504, 144485.

Research output: Contribution to journalArticleAcademicpeer-review

Graphite
Graphene
Etching
graphene
etching
15 Downloads (Pure)

Extreme UV secondary electron yield measurements of Ru, Sn, and Hf oxide thin films

Sturm, J. M., Liu, F., Darlatt, E., Kolbe, M., Aarnink, A. A. I., Lee, C. J. & Bijkerk, F., 1 Jul 2019, In : Journal of Micro/ Nanolithography, MEMS, and MOEMS. 18, 3, 033501.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
Oxide films
Thin films
oxides
Electrons
thin films

Activities 2003 2018

  • 70 Oral presentation
  • 4 Invited talk

Adaptive multilayer mirrors based on piezoelectric actuators for XUV lithography

Mohammadreza Nematollahi (Speaker), Philip Lucke (Contributor), Muharrem Bayraktar (Contributor), Kerstin Hild (Contributor), Toralf Gruner (Contributor), Andrey Yakshin (Contributor), A.J.H.M. Rijnders (Contributor), Eric Louis (Contributor), F. Bijkerk (Contributor)
12 Dec 2018

Activity: Talk or presentationOral presentation

Simulations of Damage of Ru Thin Films Induced by Single-Shot fs EUV FEL Pulses

Igor Milov (Speaker), Igor A. Makhotkin (Contributor), Ryszard Sobierajski (Contributor), Nikita Medvedev (Contributor), vladimir lipp (Contributor), N. Inogamov (Contributor), V. Zhakhovsky (Contributor), Viacheslav Medvedev (Contributor), Eric Louis (Contributor), F. Bijkerk (Contributor)
27 Mar 2018

Activity: Talk or presentationOral presentation

Stress development of thin films monitored in-situ by cantilever laser deflection and low energy ion scattering

Robbert Wilhelmus Elisabeth van de Kruijs (Speaker), Johan Reinink (Contributor), F. Bijkerk (Contributor)
11 Dec 2018

Activity: Talk or presentationOral presentation

Correlated lateral density fluctuations in the Si layers of a W/Si multilayer revealed by GISAXS

Konstantin Nikolaev (Contributor), Sergey N. Yakunin (Contributor), Igor A. Makhotkin (Speaker), Joris de la Rie (Contributor), Roman Medvedev (Contributor), A.V. Rogachev (Contributor), C.P. Hendrikx (Contributor), M. Gateshki (Contributor), Robbert Wilhelmus Elisabeth van de Kruijs (Contributor), Andrey Yakshin (Contributor), F. Bijkerk (Contributor)
8 Nov 2018

Activity: Talk or presentationOral presentation