Material Science
Thin Films
100%
Oxide
57%
Piezoelectricity
47%
Pulsed Laser Deposition
47%
Ferroelectric Material
45%
Film
37%
Devices
33%
Heterojunction
33%
Temperature
31%
Strain
25%
Ferroelectricity
21%
Electrode
18%
Density
18%
Material
18%
Surface
18%
Perovskites
18%
Nanosheet
17%
Silicon
16%
Piezoelectric Property
16%
Electronics
16%
Capacitor
15%
Film Thickness
14%
Epitaxy
14%
Buffer Layer
12%
Ferroelectric Thin Films
12%
Anisotropy
10%
Permittivity
10%
Dielectric Material
10%
Crystalline Material
8%
Actuator
8%
Gas
8%
Microstructure
7%
Conductivity
7%
Glass
7%
Reflection High-Energy Electron Diffraction
7%
Ferroelectric Film
6%
Magnetic Property
6%
Microelectromechanical System
6%
Metal
6%
X-Ray Diffraction
6%
Mechanical Strength
6%
Laser
6%
Single Crystal
6%
Bismuth Ferrite
5%
Crystal
5%
Lead Zirconate Titanate
5%
Ultrathin Films
5%
ZnO
5%
Membrane
5%
Microscopy
5%
Physics
Thin Films
67%
Oxide
42%
Substrates
40%
Ferroelectricity
35%
Growth
31%
Pulsed Laser Deposition
28%
Piezoelectricity
26%
Model
18%
Utilization
18%
Oxygen
16%
Electrodes
13%
Electric Fields
13%
Value
13%
Silicon
13%
Responses
12%
Deposition
12%
Electrons
12%
Temperature
11%
Plane
10%
Hysteresis
10%
Oxidation
9%
Domains
9%
Pressure
9%
Zenith Tubes
8%
Stoichiometry
8%
Spectroscopy
7%
Energy Storage
7%
Rotation
7%
Stability
7%
Frequencies
6%
Film Thickness
6%
Plum
6%
Dielectrics
6%
Coefficients
6%
Performance
6%
Variations
5%
Room Temperature
5%
Laser Ablation
5%
Magnetic Properties
5%
Crystals
5%
Magnetization
5%
Chemistry
Liquid Film
53%
Oxide
32%
Pulsed Laser Deposition
19%
Dioxygen
15%
Polarization
13%
Structure
13%
Thickness
11%
Surface
11%
Reaction Temperature
10%
Procedure
9%
Strain
8%
Application
8%
Silicon
8%
Ferroelectricity
8%
Time
7%
Electric Field
7%
Energy
6%
Ambient Reaction Temperature
5%
Pressure
5%
Oxidation Reaction
5%
Plasma
5%
