Igor A. Makhotkin

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20102023

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  • 2023

    Actinic Inspection of the EUV Optical Parameters of Lithographic Materials with Lab-Based Radiometry and Reflectometry

    Dorney, K. M., Kissoon, N. N., Holzmeier, F., Larsen, E. W., Singh, D. P., Arvind, S., Santra, S., Fallica, R., Makhotkin, I., Philipsen, V., De Gendt, S., Fleischmann, C., van der Heide, P. A. W. & Petersen, J. S., 28 Apr 2023, Optical and EUV Nanolithography XXXVI. Lio, A. (ed.). SPIE, 1249407. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 12494).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Open Access
    File
    1 Citation (Scopus)
    7 Downloads (Pure)
  • Precise optical constant determination in the soft X-ray, EUV, and VUV spectral range

    Abbasirad, N., Saadeh, Q., Ciesielski, R., Gottwald, A., Philippsen, V., Makhotkin, I., Sokolov, A., Kolbe, M., Scholze, F. & Soltwisch, V., 27 Apr 2023, Metrology, Inspection, and Process Control XXXVII. Robinson, J. C. & Sendelbach, M. J. (eds.). SPIE, 124963B. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 12496).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Open Access
    File
    5 Downloads (Pure)
  • 2019

    Determining the transmission of thin foil filters for soft X-ray free-electron laser radiation: an ablation imprint approach

    Burian, T., Hájková, V., Saksl, K., Vozda, V., Makhotkin, I. A., Louis, E., Schreiber, S., Tiedtke, K., Toleikis, S., Keitel, B., Plönjes, E., Ruiz-Lopez, M. I., Kuhlmann, M., Wodzinski, A., Enkisch, H., Hermann, M., Strobel, S., Loch, R. A., Sobierajski, R., Jacyna, I., & 9 othersKlinger, D., Jurek, M., Pełka, J. B., de Vries, G., Störmer, M., Scholze, F., Siewert, F., Mey, T. & Chalupský, J., 14 May 2019, Optics Damage and Materials Processing by EUV/X-ray Radiation VII. (SPIE conference proceedings; vol. 11035).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

  • 2013

    Optimization of LaN/B multilayer mirrors for 6.x nm wavelength

    Makhotkin, I. A., van de Kruijs, R. W. E., Zoethout, E., Louis, E. & Bijkerk, F., 25 Aug 2013, Advances in X-Ray/EUV Optics and Components VIII. Khounsary, A., Goto, S. & Morawe, C. (eds.). SPIE, p. 1-5 5 p. (Proceedings of SPIE; vol. 8848).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    3 Citations (Scopus)
    1 Downloads (Pure)
  • 2012

    Wavelength selection for multilayer coatings for the lithography generation beyond EUVL

    Makhotkin, I. A., Zoethout, E., Louis, E., Yakunin, S. N., Muellender, S. & Bijkerk, F., 13 Mar 2012, Extreme Ultraviolet (EUV) Lithography III. Naulleau, P. P. & Wood II, O. R. (eds.). Bellingham, WA: SPIE, 5 p. 832213. (Proceedings of SPIE; vol. 8322).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    3 Citations (Scopus)
    6 Downloads (Pure)