Jos Benschop

  • 117 Citations
  • 5 h-Index
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Extreme ultraviolet lithography Engineering & Materials Science
blisters Physics & Astronomy
Lithography Engineering & Materials Science
lithography Physics & Astronomy
scanners Physics & Astronomy
manufacturing Physics & Astronomy
Hydrogen Chemical Compounds
hydrogen ions Physics & Astronomy

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Research Output 2008 2020

1 Citation (Scopus)

EUV Lithography at Threshold of High-Volume Manufacturing∗

Yen, A., Meiling, H. & Benschop, J., 16 Jan 2019, 2018 IEEE International Electron Devices Meeting, IEDM 2018. IEEE, p. 11.6.1-11.6.4 8614502. (Technical Digest - International Electron Devices Meeting, IEDM; vol. 2018-December).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Extreme ultraviolet lithography
2 Citations (Scopus)
13 Downloads (Pure)

Influence of internal stress and layer thickness on the formation of hydrogen induced thin film blisters in Mo/Si multilayers

van den Bos, R. A. J. M., Reinink, J., Lopaev, D. V., Lee, C. J., Benschop, J. P. H. & Bijkerk, F., 22 Feb 2018, In : Journal of physics D: applied physics. 51, 11, 11 p., 115302.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
residual stress
Residual stresses