Jos Benschop

prof.dr.ir.

  • 117 Citations
  • 5 h-Index
20082020
If you made any changes in Pure these will be visible here soon.

Fingerprint Dive into the research topics where Jos Benschop is active. These topic labels come from the works of this person. Together they form a unique fingerprint.

  • 2 Similar Profiles
Extreme ultraviolet lithography Engineering & Materials Science
blisters Physics & Astronomy
Lithography Engineering & Materials Science
lithography Physics & Astronomy
scanners Physics & Astronomy
manufacturing Physics & Astronomy
Hydrogen Chemical Compounds
hydrogen ions Physics & Astronomy

Network Recent external collaboration on country level. Dive into details by clicking on the dots.

Research Output 2008 2020

1 Citation (Scopus)

EUV Lithography at Threshold of High-Volume Manufacturing∗

Yen, A., Meiling, H. & Benschop, J., 16 Jan 2019, 2018 IEEE International Electron Devices Meeting, IEDM 2018. IEEE, p. 11.6.1-11.6.4 8614502. (Technical Digest - International Electron Devices Meeting, IEDM; vol. 2018-December).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Extreme ultraviolet lithography
lithography
manufacturing
Throughput
thresholds
2 Citations (Scopus)
13 Downloads (Pure)

Influence of internal stress and layer thickness on the formation of hydrogen induced thin film blisters in Mo/Si multilayers

van den Bos, R. A. J. M., Reinink, J., Lopaev, D. V., Lee, C. J., Benschop, J. P. H. & Bijkerk, F., 22 Feb 2018, In : Journal of physics D: applied physics. 51, 11, 11 p., 115302.

Research output: Contribution to journalArticleAcademicpeer-review

Open Access
File
blisters
residual stress
Hydrogen
Residual stresses
Multilayers