Jos Benschop

prof.dr.ir.

  • Source: Scopus
  • Calculated based on no. of publications stored in Pure and citations from Scopus
20082021

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  • 2019

    EUV Lithography at Threshold of High-Volume Manufacturing∗

    Yen, A., Meiling, H. & Benschop, J., 16 Jan 2019, 2018 IEEE International Electron Devices Meeting, IEDM 2018. IEEE, p. 11.6.1-11.6.4 8614502. (Technical Digest - International Electron Devices Meeting, IEDM; vol. 2018-December).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    3 Citations (Scopus)
  • 2013

    Integrated scatterometry for tight overlay and CD control to enable 20-nm node wafer manufacturing

    Benschop, J., Engelen, A., Cramer, H., Kubis, M., Hinnen, P., Van Der Laan, H., Bhattacharyya, K. & Mulkens, J., 5 Jun 2013, Optical Microlithography XXVI. 86830P. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 8683).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    23 Citations (Scopus)
  • 2010

    Extreme UltraViolet lithography

    Benschop, J. & Loopstra, E., 1 Jan 2010, Proceedings of the 10th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2010. Van Brussel, H., Spaan, H., Shore, P. & Burke, T. (eds.). EUSPEN, p. 2-5 4 p. (Proceedings of the 10th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2010; vol. 1).

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review