Muharrem Bayraktar

dr.

Calculated based on number of publications stored in Pure and citations from Scopus
20092022

Research activity per year

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Network

Andrey Yakshin

Person: Academic

Robbert W.E. van de Kruijs

Person: Academic

Eric Louis

  • XUV Optics - Other Research Staff, Associate Professor

Person: PNUT

Mark A. Hempenius

Person: Academic

Ruben Schupp

  • Advanced Research Center for Nanolithography (ARCNL)
  • Science Park 106
  • Vrije Universiteit

External person

W. Ubachs

  • Science Park 106
  • Vrije Universiteit

External person

J. Sheil

  • Advanced Research Center for Nanolithography (ARCNL)
  • Science Park 106

External person

Zoi Bouza

  • Advanced Research Center for Nanolithography (ARCNL)
  • Science Park 106
  • Vrije Universiteit

External person

Oscar Versolato

  • Advanced Research Center for Nanolithography (ARCNL)
  • Vrije Universiteit

External person

Lars Behnke

  • Advanced Research Center for Nanolithography (ARCNL)
  • Vrije Universiteit

External person

Joris Scheers

  • Advanced Research Center for Nanolithography (ARCNL)
  • Science Park 106
  • Vrije Universiteit

External person

Fei Liu

  • ASML Netherlands BV

External person

Ronnie Hoekstra

  • Advanced Research Center for Nanolithography (ARCNL)
  • Zernike Institute for Advanced Materials
  • University of Groningen

External person

Caspar Bruineman

  • Scientec Engineering

External person

Francesco Torretti

  • Advanced Research Center for Nanolithography (ARCNL)
  • Vrije Universiteit

External person

J Crespo Lopez-Urrutia

  • Max Planck Institut fur Kernphysik

External person

C Shah

  • Max Planck Institut fur Kernphysik

External person

Randy A. Meijer

  • Advanced Research Center for Nanolithography (ARCNL)

External person

S. Witte

  • Advanced Research Center for Nanolithography (ARCNL)

External person

Yahia Mostafa

  • Advanced Research Center for Nanolithography (ARCNL)
  • Science Park 106
  • Vrije Universiteit

External person

A Ryabtsev

  • RAS - Institute of Spectroscopy

External person

O.O. Versolato

  • Science Park 106
  • Vrije Universiteit

External person

Meriç Özcan

  • Sabanci University
  • University Medical Center Groningen

External person

L Poirier

  • Advanced Research Center for Nanolithography (ARCNL)

External person

H. Bekker

  • Max Planck Institut fur Kernphysik

External person

Alex Bayerle

  • Advanced Research Center for Nanolithography (ARCNL)

External person

Zeudi Mazzotta

  • Advanced Research Center for Nanolithography (ARCNL)
  • Vrije Universiteit
  • Science Park 106

External person

Amanda Neukirch

  • Los Alamos National Laboratory

External person

James Colgan

  • Los Alamos National Laboratory

External person

I.V. Kozhevnikov

  • RAS - Shubnikov Institute of Crystallography

External person

S Rai

  • Advanced Research Center for Nanolithography (ARCNL)

External person

Dimitry Kurilovich

  • Advanced Research Center for Nanolithography (ARCNL)

External person

Robert de Kruif

  • ASML Netherlands BV

External person

Natalia Davydova

  • ASML Netherlands BV

External person

Dmitry Kurilovich

  • Advanced Research Center for Nanolithography (ARCNL)
  • Vrije Universiteit

External person

Xueqing Zhang

  • Dutch Institute for Fundamental Energy Research
  • Center for Computational Energy Research
  • ASML Netherlands BV

External person

Marieke Meeuwissen

  • ASML Netherlands BV

External person

John Sheil

  • Advanced Research Center for Nanolithography (ARCNL)
  • Vrije Universiteit

External person

Adam Lassise

  • Advanced Research Center for Nanolithography (ARCNL)
  • Vrije Universiteit

External person

Tim Goossens

  • ASML Netherlands BV

External person

Mark van de Kerkhof

  • ASML Netherlands BV

External person

M J Deuzeman

  • Advanced Research Center for Nanolithography (ARCNL)

External person

K.S.E. Eikema

  • Advanced Research Center for Nanolithography (ARCNL)

External person

Wim Ubachs

  • Advanced Research Center for Nanolithography (ARCNL)
  • Vrije Universiteit

External person

Olav Frijns

  • ASML Netherlands BV

External person

M M Basko

  • RAS - Keldysh Institute of Applied Mathematics

External person

Peter Havermans

  • ASML Netherlands BV

External person

Jorge Quintana Ramirez

  • ASML Netherlands BV

External person

M. Purvis

  • ASML US LP

External person

Felix Wahlish

  • ASML Netherlands BV

External person

Jong-Koon Lim

  • ASML Netherlands BV

External person

Guido Schiffelers

  • ASML Netherlands BV

External person

Jeroen Rommers

  • ASML Netherlands BV
  • Delft University of Technology

External person

Laurens de Winter

  • ASML Netherlands BV

External person

Ben Claes

  • ASML Netherlands BV

External person

John McNamara

  • ASML Netherlands BV

External person

Wouter Varenkamp

  • ASML Netherlands BV

External person

Tijs Beenhakker

  • ASML Netherlands BV

External person

Kees Ricken

  • ASML Netherlands BV

External person