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Philip Lucke

Researcher, Mesa+
Researcher, XUV Optics

https://orcid.org/0000-0003-3636-6138

Source: Scopus
Calculated based on no. of publications stored in Pure and citations from Scopus

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3 Citations
1 h-Index
3 Article
2 Poster
1 Patent

1 results

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2020
Mirror for a microlithographic projection exposure system, and method for operating a deformable mirror
Lippert, J., Gruner, T., Hild, K., Lucke, P. & Nematollahi, M., 30 Jan 2020, IPC No. G03F 7/ 20 A I, Patent No. WO2020020550, Priority date 26 Jul 2018, Priority No. DE201810212508
Research output: Patent