Robbert W.E. van de Kruijs

dr.ir.

  • 976 Citations
  • 18 h-Index
20032020
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Research Output 2003 2020

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Conference contribution
2019

Multilayer filter using the borrmann effect for euv source monitoring

Barreaux, J. L. P., Kozhevnikov, I. V., Bastiaens, H. M. J., van de Kruijs, R. W. E., Bijkerk, F. & Boller, K. J., 1 Jan 2019, Proceedings 2015 European Conference on Lasers and Electro-Optics - European Quantum Electronics Conference, CLEO/Europe-EQEC 2015. Optical Society of America

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

2018
10 Citations (Scopus)
14 Downloads (Pure)

Novel EUV mask absorber evaluation in support of next-generation EUV imaging

Philipsen, V., Luong, K. V., Opsomer, K., Detavernier, C., Hendrickx, E., Erdmann, A., Evanschitzky, P., Van De Kruijs, R. W. E., Heidarnia-Fathabad, Z., Scholze, F. & Laubis, C., 10 Oct 2018, Photomask Technology 2018. Gallagher, E. E. & Rankin, J. H. (eds.). SPIE, Vol. 10810. 108100C. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 10810).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Open Access
File
EUV Mask
Absorber
Mask
Masks
absorbers
2017

In vacuo low-energy ions scattering studies of ZrO2 growth by magnetron sputtering

Sturm, J. M., Coloma Ribera, R., van de Kruijs, R. W. E., Yakshin, A. & Bijkerk, F., 3 Nov 2017, In vacuo low-energy ions scattering studies of ZrO2 growth by magnetron sputtering.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademic

ion scattering
magnetron sputtering
passivity
energy
silicates
12 Citations (Scopus)
4 Downloads (Pure)

Pellicle films supporting the ramp to HVM with EUV

van Zwol, P. J., Nasalevich, M., Voorthuijzen, W. P., Kurganova, E., Notenboom, A., Vles, D. F., Peter, M., Symens, W., Giesbers, A. J. M., Klootwijk, J. H., Van De Kruijs, R. W. E. & Zande, W. J., 2017, Photomask Technology 2017. SPIE, 9 p. 104510O. (Proceedings of SPIE; vol. 10451).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

pellicle
ramps
Silicides
Graphite
silicides
16 Citations (Scopus)

Reducing EUV mask 3D effects by alternative metal absorbers

Philipsen, V., Luong, K. V., Souriau, L., Hendrickx, E., Erdmann, A., Xu, D., Evanschitzky, P., Van De Kruijs, R. W. E., Edrisi, A., Scholze, F., Laubis, C., Irmscher, M., Naasz, S. & Reuter, C., 24 Mar 2017, Extreme Ultraviolet (EUV) Lithography VIII. SPIE, Vol. 10143. 1014310

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

absorbers (materials)
EUV Mask
Absorber
Masks
absorbers
2016

Influence of the surface oxide content of a boron capping layer on UV photodetector performance

Mohammadi, V., Van De Kruijs, R. W. E., Rao, P. R., Sturm, J. M. & Nihtianov, S., 21 Mar 2016, 2015 9th International Conference on Sensing Technology, ICST 2015. IEEE Computer Society, Vol. 2016-March. p. 656-660 5 p. 7438479

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Photodetectors
Boron
Chemical vapor deposition
Oxides
Physical vapor deposition
2015

High reflectance La/B based multilayer mirrors for 6.x nm wavelength

Kuznetsov, D., Yakshin, A., Sturm, M., Van De Kruijs, R., Louis, E. & Bijkerk, F., 2015, Advances in X-Ray/EUV Optics and Components X. Goto, S., Morawe, C. & Khounsary, A. M. (eds.). Bellingham, WA: SPIE, 958806. (Proceedings of SPIE; vol. 9588).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Reflectivity
Reflectance
Multilayer
Mirror
Multilayers
1 Citation (Scopus)

Surface oxide content examination of capping boron layers in UV photodetectors

Mohammadi, V., Rao, P. R., Van De Kruijs, R. W. E. & Nihtianov, S., 3 Aug 2015, 73rd Annual Device Research Conference, DRC 2015. IEEE, Vol. 2015-August. p. 73-74 2 p. 7175562

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Photodetectors
Boron
Ultraviolet detectors
Oxides
Photodiodes
2014
1 Citation (Scopus)

Spectral purity enhancement for the EUV Lithography Systems by suppressing UV reflection from multilayers

Huang, Q., de Boer, M. J., Barreaux, J. L. P., Paardekooper, D. M., van den Boogaard, T., van de Kruijs, R. W. E., Zoethout, E., Louis, E. & Bijkerk, F., 2014, Extreme Ultraviolet (EUV) Lithography V. Wood, O.R. & Panning, E.M. (eds.). San Jose, CA: SPIE - The International Society for Optical Engineering, p. - (Proceedings of SPIE; vol. 9048).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

ultraviolet reflection
purity
lithography
pyramids
augmentation
2013
2 Citations (Scopus)

Engineering optical constants for broadband single layer antireflection coatings

Huber, S. P., van de Kruijs, R. W. E., Yakshin, A. E., Zoethout, E. & Bijkerk, F., 27 Sep 2013, Advances in X-Ray/EUV Optics and Components VIII. Khounsary, A., Goto, S. & Morawe, C. (eds.). SPIE, 884814. (Proceedings of SPIE; vol. 8848).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

antireflection coatings
retarding
engineering
broadband
nitrogen ions
9 Downloads (Pure)

EUV optical elements with enhanced spectral selectivity for IR radiation

Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Louis, E. & Bijkerk, F., 2013, 2013 International Workshop in EUV and Soft X-ray Sources. Medvedev, V. V. (ed.). Dublin, Ireland: EUV Litho, Inc., p. -

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Open Access
File
3 Citations (Scopus)

Optimization of LaN/B multilayer mirrors for 6.x nm wavelength

Makhotkin, I. A., van de Kruijs, R. W. E., Zoethout, E., Louis, E. & Bijkerk, F., 25 Aug 2013, Advances in X-Ray/EUV Optics and Components VIII. Khounsary, A., Goto, S. & Morawe, C. (eds.). SPIE, p. 1-5 5 p. (Proceedings of SPIE; vol. 8848).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

mirrors
reflectance
optimization
wavelengths
magnetron sputtering
2 Citations (Scopus)

Suppression of long wavelength reflection from extreme-UV multilayer optics

Huang, Q., van den Boogaard, T., van de Kruijs, R. W. E., Zoethout, E., Medvedev, V., Louis, E. & Bijkerk, F., 25 Aug 2013, Advances in X-Ray/EUV Optics and Components VIII. Khounsary, A., Goto, S. & Morawe, C. (eds.). Bellingham, WA: SPIE, p. 5- (Proceedings of SPIE; vol. 8848).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

retarding
optics
wavelengths
gratings
extreme ultraviolet radiation
2011
4 Citations (Scopus)

Blistering behavior in Mo/Si multilayers

Kuznetsov, A. S., Gleeson, M. A., van de Kruijs, R. W. E. & Bijkerk, F., 18 Apr 2011, SPIE Optics + Optoelectronics 2011. Kuznetsov, A. S. (ed.). SPIE, 6 p. 807713. (Proceedings of SPIE; vol. 8077).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

blisters
hydrogen isotopes
gas flow
fluence
damage
1 Citation (Scopus)

Interface diffusion kinetics and lifetime scaling in multilayer Bragg optics

van de Kruijs, R. W. E., Bruijn, S., Yakshin, A., Nedelcu, I. & Bijkerk, F., 2011, Advances in X-Ray/ EUV optics and Components VI: 22–24 August 2011, San Diego, California, United States. Morawe, C., Khounsary, A. M. & Goto, S. (eds.). Bellingham, WA: SPIE, 81390A. (Proceedings of SPIE; vol. 8139).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

optics
scaling
life (durability)
kinetics
scaling laws
2009
13 Citations (Scopus)

Improved contrast and reflectivity of multilayer reflective optics for wavelenghts beyond the Extreme UV

Tsarfati, T., Zoethout, E., Louis, E., van de Kruijs, R. W. E., Yakshin, A., Müllender, S. & Bijkerk, F., 24 Feb 2009, Proceedings of SPIE, The International Society for Optical Engineering. Schellenberg, F. M. & La Fontaine, B. M. (eds.). San Jose, CA, USA: SPIE, p. 72713V- (Proceedings of SPIE; vol. 7271).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

optics
reflectance
photolithography
passivity
interlayers
2006
4 Citations (Scopus)

Multilayer optics with spectral purity layers for the EUV wavelength range

Louis, E., Van De Kruijs, R. W. E., Yakshin, A. E., Van Der Westen, S. A., Bijkerk, F., Van Herpen, M. M. J. W., Klunder, D. J. W., Bakker, L., Enkisch, H., Müllender, S., Richter, M. & Banine, V., 10 Jul 2006, Emerging Lithographic Technologies X. 615139. (Proceedings of SPIE - The International Society for Optical Engineering; vol. 6151 II).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

Reflectance
Multilayer
Optics
Multilayers
purity