Robbert W.E. van de Kruijs

dr.ir.

Source: Scopus
Calculated based on no. of publications stored in Pure and citations from Scopus

Research output per year

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2020
Pellicle for EUV lithograpy
Shafikov, A., Bijkerk, F., Schurink, B., Sturm, M. & van de Kruijs, R. W. E., 15 Oct 2020, IPC No. G03F 7/ 20 A I, Patent No. NL2025186, Priority date 12 Apr 2019, Priority No. EP20190168871
Research output: Patent
2014

Method for producing a reflective optical element for EUV-lithography
Kuznetsov, A., Gleeson, M. A., van de Kruijs, R. W. E. & Bijkerk, F., 10 Jul 2014, (In preparation) Patent No. 14/137,225, Priority date 20 Dec 2013, Priority No. 10 2011 077 983.3
Research output: Patent
Optical element comprising a multilayer coating, and optical arrangement comprising same
van de Kruijs, R. W. E., Nyabero, S. L., Yakshin, A. & Bijkerk, F., 6 Nov 2014, (Submitted) Patent No. PCT/EP2014/057637, Priority date 6 Nov 2014, Priority No. 10 2013 207 751.3 29 April 2013 (29.04.2013) DE
Research output: Patent
2011

Verfahren zur Herstellung eines reflektiven optischen Elements für die EUV-Lithographie
Kuznetsov, A., Gleeson, M., van de Kruijs, R. W. E. & Bijkerk, F., 2011, (In preparation) Patent No. DE 10 2011 077 983A1, Priority date 27 Apr 2011
Research output: Patent
2010
Reflective element for EUV lithography device
Yakshin, A., van de Kruijs, R. W. E., Bijkerk, F., Louis, E. & Nedelcu, I., 2010, (Submitted) Patent No. US20090536251 20090805, Priority date 5 Aug 2009
Research output: Patent

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