2D-Confined Nanochannels Fabricated by Conventional Micromachining

Niels Roelof Tas, Johan W. Berenschot, Theodorus S.J. Lammerink, P. Mela, Henricus V. Jansen, Michael Curt Elwenspoek, Albert van den Berg

    Research output: Contribution to journalArticleAcademicpeer-review

    86 Citations (Scopus)

    Abstract

    Two new methods have been developed to fabricate nanochannels by conventional micromachining. We succeeded in restricting the width of the channels to the submicrometer scale, while using standard photolithography with a resolution in the order of 1 μm. The first method is based on the sacrificial etching of a nanowire, which was formed on the side wall of a step. The second method is based on the adhesion of the capping layer to the substrate after removal of a sacrificial strip separating the two. The fabricated nanochannels are localized and can be connected to microchannels and reservoirs
    Original languageUndefined
    Pages (from-to)1031-1032
    Number of pages2
    JournalNano letters
    Volume2
    Issue number9
    DOIs
    Publication statusPublished - Sep 2002

    Keywords

    • EWI-12702
    • METIS-206816
    • IR-43530

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