2D-Confined Nanochannels Fabricated by Conventional Micromachining

Niels Roelof Tas; Johan W. Berenschot; Theodorus S.J. Lammerink; P. Mela; Henricus V. Jansen; Michael Curt Elwenspoek; Albert van den Berg

doi:10.1021/nl025693r

2D-Confined Nanochannels Fabricated by Conventional Micromachining

Niels Roelof Tas, Johan W. Berenschot, Theodorus S.J. Lammerink, P. Mela, Henricus V. Jansen, Michael Curt Elwenspoek, Albert van den Berg

Research output: Contribution to journal › Article › Academic › peer-review

86 Citations (Scopus)

Abstract

Two new methods have been developed to fabricate nanochannels by conventional micromachining. We succeeded in restricting the width of the channels to the submicrometer scale, while using standard photolithography with a resolution in the order of 1 μm. The first method is based on the sacrificial etching of a nanowire, which was formed on the side wall of a step. The second method is based on the adhesion of the capping layer to the substrate after removal of a sacrificial strip separating the two. The fabricated nanochannels are localized and can be connected to microchannels and reservoirs

Original language	Undefined
Pages (from-to)	1031-1032
Number of pages	2
Journal	Nano letters
Volume	2
Issue number	9
DOIs	https://doi.org/10.1021/nl025693r
Publication status	Published - Sep 2002

Keywords

EWI-12702
METIS-206816
IR-43530

Access to Document

10.1021/nl025693r

http://eprints.eemcs.utwente.nl/secure2/12702/01/JNL_2_1031.pdf

Cite this

Tas, N. R., Berenschot, J. W., Lammerink, T. S. J., Mela, P., Jansen, H. V., Elwenspoek, M. C., & van den Berg, A. (2002). 2D-Confined Nanochannels Fabricated by Conventional Micromachining. Nano letters, 2(9), 1031-1032. https://doi.org/10.1021/nl025693r

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abstract = "Two new methods have been developed to fabricate nanochannels by conventional micromachining. We succeeded in restricting the width of the channels to the submicrometer scale, while using standard photolithography with a resolution in the order of 1 μm. The first method is based on the sacrificial etching of a nanowire, which was formed on the side wall of a step. The second method is based on the adhesion of the capping layer to the substrate after removal of a sacrificial strip separating the two. The fabricated nanochannels are localized and can be connected to microchannels and reservoirs",

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AU - Tas, Niels Roelof

AU - Berenschot, Johan W.

AU - Lammerink, Theodorus S.J.

AU - Mela, P.

AU - Jansen, Henricus V.

AU - Elwenspoek, Michael Curt

AU - van den Berg, Albert

PY - 2002/9

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N2 - Two new methods have been developed to fabricate nanochannels by conventional micromachining. We succeeded in restricting the width of the channels to the submicrometer scale, while using standard photolithography with a resolution in the order of 1 μm. The first method is based on the sacrificial etching of a nanowire, which was formed on the side wall of a step. The second method is based on the adhesion of the capping layer to the substrate after removal of a sacrificial strip separating the two. The fabricated nanochannels are localized and can be connected to microchannels and reservoirs

AB - Two new methods have been developed to fabricate nanochannels by conventional micromachining. We succeeded in restricting the width of the channels to the submicrometer scale, while using standard photolithography with a resolution in the order of 1 μm. The first method is based on the sacrificial etching of a nanowire, which was formed on the side wall of a step. The second method is based on the adhesion of the capping layer to the substrate after removal of a sacrificial strip separating the two. The fabricated nanochannels are localized and can be connected to microchannels and reservoirs

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U2 - 10.1021/nl025693r

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