2D-Confined Nanochannels Fabricated by Conventional Micromachining

Niels Roelof Tas, Johan W. Berenschot, Theodorus S.J. Lammerink, P. Mela, Henricus V. Jansen, Michael Curt Elwenspoek, Albert van den Berg

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    Two new methods have been developed to fabricate nanochannels by conventional micromachining. We succeeded in restricting the width of the channels to the submicrometer scale, while using standard photolithography with a resolution in the order of 1 μm. The first method is based on the sacrificial etching of a nanowire, which was formed on the side wall of a step. The second method is based on the adhesion of the capping layer to the substrate after removal of a sacrificial strip separating the two. The fabricated nanochannels are localized and can be connected to microchannels and reservoirs
    Original languageUndefined
    Pages (from-to)1031-1032
    Number of pages2
    JournalNano letters
    Issue number9
    Publication statusPublished - Sept 2002


    • EWI-12702
    • METIS-206816
    • IR-43530

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