2D-Confined Nanochannels Fabricated by Conventional Micromachining

Niels Roelof Tas, Johan W. Berenschot, Theodorus S.J. Lammerink, P. Mela, Henricus V. Jansen, Michael Curt Elwenspoek, Albert van den Berg

    Research output: Contribution to journal › Article › Academic › peer-review

    86 Citations (Scopus)

    Abstract

    Two new methods have been developed to fabricate nanochannels by conventional micromachining. We succeeded in restricting the width of the channels to the submicrometer scale, while using standard photolithography with a resolution in the order of 1 μm. The first method is based on the sacrificial etching of a nanowire, which was formed on the side wall of a step. The second method is based on the adhesion of the capping layer to the substrate after removal of a sacrificial strip separating the two. The fabricated nanochannels are localized and can be connected to microchannels and reservoirs
    Original languageUndefined
    Pages (from-to)1031-1032
    Number of pages2
    JournalNano letters
    Volume2
    Issue number9
    DOIs
    Publication statusPublished - Sep 2002

    Keywords

    • EWI-12702
    • METIS-206816
    • IR-43530

    Cite this

    Tas, Niels Roelof ; Berenschot, Johan W. ; Lammerink, Theodorus S.J. ; Mela, P. ; Jansen, Henricus V. ; Elwenspoek, Michael Curt ; van den Berg, Albert. / 2D-Confined Nanochannels Fabricated by Conventional Micromachining. In: Nano letters. 2002 ; Vol. 2, No. 9. pp. 1031-1032.
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    title = "2D-Confined Nanochannels Fabricated by Conventional Micromachining",
    abstract = "Two new methods have been developed to fabricate nanochannels by conventional micromachining. We succeeded in restricting the width of the channels to the submicrometer scale, while using standard photolithography with a resolution in the order of 1 μm. The first method is based on the sacrificial etching of a nanowire, which was formed on the side wall of a step. The second method is based on the adhesion of the capping layer to the substrate after removal of a sacrificial strip separating the two. The fabricated nanochannels are localized and can be connected to microchannels and reservoirs",
    keywords = "EWI-12702, METIS-206816, IR-43530",
    author = "Tas, {Niels Roelof} and Berenschot, {Johan W.} and Lammerink, {Theodorus S.J.} and P. Mela and Jansen, {Henricus V.} and Elwenspoek, {Michael Curt} and {van den Berg}, Albert",
    year = "2002",
    month = "9",
    doi = "10.1021/nl025693r",
    language = "Undefined",
    volume = "2",
    pages = "1031--1032",
    journal = "Nano letters",
    issn = "1530-6984",
    publisher = "American Chemical Society",
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    }

    Tas, NR, Berenschot, JW, Lammerink, TSJ, Mela, P, Jansen, HV, Elwenspoek, MC & van den Berg, A 2002, '2D-Confined Nanochannels Fabricated by Conventional Micromachining', Nano letters, vol. 2, no. 9, pp. 1031-1032. https://doi.org/10.1021/nl025693r

    2D-Confined Nanochannels Fabricated by Conventional Micromachining. / Tas, Niels Roelof; Berenschot, Johan W.; Lammerink, Theodorus S.J.; Mela, P.; Jansen, Henricus V.; Elwenspoek, Michael Curt; van den Berg, Albert.

    In: Nano letters, Vol. 2, No. 9, 09.2002, p. 1031-1032.

    Research output: Contribution to journal › Article › Academic › peer-review

    TY - JOUR

    T1 - 2D-Confined Nanochannels Fabricated by Conventional Micromachining

    AU - Tas, Niels Roelof

    AU - Berenschot, Johan W.

    AU - Lammerink, Theodorus S.J.

    AU - Mela, P.

    AU - Jansen, Henricus V.

    AU - Elwenspoek, Michael Curt

    AU - van den Berg, Albert

    PY - 2002/9

    Y1 - 2002/9

    N2 - Two new methods have been developed to fabricate nanochannels by conventional micromachining. We succeeded in restricting the width of the channels to the submicrometer scale, while using standard photolithography with a resolution in the order of 1 μm. The first method is based on the sacrificial etching of a nanowire, which was formed on the side wall of a step. The second method is based on the adhesion of the capping layer to the substrate after removal of a sacrificial strip separating the two. The fabricated nanochannels are localized and can be connected to microchannels and reservoirs

    AB - Two new methods have been developed to fabricate nanochannels by conventional micromachining. We succeeded in restricting the width of the channels to the submicrometer scale, while using standard photolithography with a resolution in the order of 1 μm. The first method is based on the sacrificial etching of a nanowire, which was formed on the side wall of a step. The second method is based on the adhesion of the capping layer to the substrate after removal of a sacrificial strip separating the two. The fabricated nanochannels are localized and can be connected to microchannels and reservoirs

    KW - EWI-12702

    KW - METIS-206816

    KW - IR-43530

    U2 - 10.1021/nl025693r

    DO - 10.1021/nl025693r

    M3 - Article

    VL - 2

    SP - 1031

    EP - 1032

    JO - Nano letters

    JF - Nano letters

    SN - 1530-6984

    IS - 9

    ER -

    Tas NR, Berenschot JW, Lammerink TSJ, Mela P, Jansen HV, Elwenspoek MC et al. 2D-Confined Nanochannels Fabricated by Conventional Micromachining. Nano letters. 2002 Sep;2(9):1031-1032. https://doi.org/10.1021/nl025693r

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