2D PIC Modeling of the EUV Induced Hydrogen Plasma and Comparison to the Observed Carbon Etching Rate

Dmitry Astakhov, W.J. Goedheer, D. Lopaev, V. Ivanov, O. Yakushev, V.M. Krivtsun, K. Koshelev, Frederik Bijkerk

Research output: Contribution to conferencePoster

10 Downloads (Pure)
Original languageEnglish
Pages49-49
Publication statusPublished - 8 Oct 2012
Event2012 International Workshop on EUV and Soft X-ray Sources - Dublin, Ireland
Duration: 8 Oct 201211 Oct 2012
https://euvlitho.com/source-workshop/2012-source-workshop/

Conference

Conference2012 International Workshop on EUV and Soft X-ray Sources
CountryIreland
CityDublin
Period8/10/1211/10/12
Internet address

Keywords

  • METIS-293971

Cite this

Astakhov, D., Goedheer, W. J., Lopaev, D., Ivanov, V., Yakushev, O., Krivtsun, V. M., ... Bijkerk, F. (2012). 2D PIC Modeling of the EUV Induced Hydrogen Plasma and Comparison to the Observed Carbon Etching Rate. 49-49. Poster session presented at 2012 International Workshop on EUV and Soft X-ray Sources, Dublin, Ireland.