2D PIC Modeling of the EUV Induced Hydrogen Plasma and Comparison to the Observed Carbon Etching Rate

Dmitry Astakhov, W.J. Goedheer, D. Lopaev, V. Ivanov, O. Yakushev, V.M. Krivtsun, K. Koshelev, Frederik Bijkerk

Research output: Contribution to conference › Poster

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Original language	English
Pages	49-49
Publication status	Published - 8 Oct 2012
Event	2012 International Workshop on EUV and Soft X-ray Sources - Dublin, Ireland Duration: 8 Oct 2012 → 11 Oct 2012 https://euvlitho.com/source-workshop/2012-source-workshop/

Conference	2012 International Workshop on EUV and Soft X-ray Sources
Country	Ireland
City	Dublin
Period	8/10/12 → 11/10/12
Internet address	https://euvlitho.com/source-workshop/2012-source-workshop/

Astakhov, D., Goedheer, W. J., Lopaev, D., Ivanov, V., Yakushev, O., Krivtsun, V. M., ... Bijkerk, F. (2012). 2D PIC Modeling of the EUV Induced Hydrogen Plasma and Comparison to the Observed Carbon Etching Rate. 49-49. Poster session presented at 2012 International Workshop on EUV and Soft X-ray Sources, Dublin, Ireland.

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title = "2D PIC Modeling of the EUV Induced Hydrogen Plasma and Comparison to the Observed Carbon Etching Rate",

keywords = "METIS-293971",

author = "Dmitry Astakhov and W.J. Goedheer and D. Lopaev and V. Ivanov and O. Yakushev and V.M. Krivtsun and K. Koshelev and Frederik Bijkerk",

year = "2012",

month = "10",

day = "8",

language = "English",

pages = "49--49",

note = "2012 International Workshop on EUV and Soft X-ray Sources ; Conference date: 08-10-2012 Through 11-10-2012",

url = "https://euvlitho.com/source-workshop/2012-source-workshop/",

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2012. 49-49 Poster session presented at 2012 International Workshop on EUV and Soft X-ray Sources, Dublin, Ireland.

Research output: Contribution to conference › Poster