3D-Nanomachining using corner lithography

Johan W. Berenschot, Niels Roelof Tas, Henricus V. Jansen, Michael Curt Elwenspoek

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    22 Citations (Scopus)
    90 Downloads (Pure)

    Abstract

    We present a fabrication method to create 3D nano structures without the need for nano lithography. The method, named "corner lithography" is based on conformal deposition and subsequent isotropic thinning of a thin film. The material that remains in sharp concave corners is either used as a mask or directly as structural material. The method is demonstrated for nano scale modifications of pyramidal tips, as well as the creation of suspended nanowires.
    Original languageEnglish
    Title of host publication3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008
    Place of PublicationPiscataway
    PublisherIEEE Computer Society Press
    Pages729-732
    Number of pages4
    ISBN (Print)978-1-4244-1907-4
    DOIs
    Publication statusPublished - 6 Jan 2008
    Event3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008 - Resort Horizon Sanya, Sanya, China
    Duration: 6 Jan 20089 Jan 2008
    Conference number: 3

    Publication series

    Name
    PublisherIEEE Computer Society Press
    NumberWoTUG-31

    Conference

    Conference3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008
    Abbreviated titleNEMS
    CountryChina
    CitySanya
    Period6/01/089/01/08

    Keywords

    • IR-65148
    • EWI-14246
    • METIS-254923

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  • Cite this

    Berenschot, J. W., Tas, N. R., Jansen, H. V., & Elwenspoek, M. C. (2008). 3D-Nanomachining using corner lithography. In 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008 (pp. 729-732). Piscataway: IEEE Computer Society Press. https://doi.org/10.1109/NEMS.2008.4484432