3D-Nanomachining using corner lithography

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

21 Citations (Scopus)
67 Downloads (Pure)

Abstract

We present a fabrication method to create 3D nano structures without the need for nano lithography. The method, named "corner lithography" is based on conformal deposition and subsequent isotropic thinning of a thin film. The material that remains in sharp concave corners is either used as a mask or directly as structural material. The method is demonstrated for nano scale modifications of pyramidal tips, as well as the creation of suspended nanowires.
Original languageEnglish
Title of host publication3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008
Place of PublicationPiscataway
PublisherIEEE Computer Society Press
Pages729-732
Number of pages4
ISBN (Print)978-1-4244-1907-4
DOIs
Publication statusPublished - 6 Jan 2008
Event3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008 - Resort Horizon Sanya, Sanya, China
Duration: 6 Jan 20089 Jan 2008
Conference number: 3

Publication series

Name
PublisherIEEE Computer Society Press
NumberWoTUG-31

Conference

Conference3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008
Abbreviated titleNEMS
CountryChina
CitySanya
Period6/01/089/01/08

Fingerprint

lithography
nanowires
masks
fabrication
thin films

Keywords

  • IR-65148
  • EWI-14246
  • METIS-254923

Cite this

Berenschot, J. W., Tas, N. R., Jansen, H. V., & Elwenspoek, M. C. (2008). 3D-Nanomachining using corner lithography. In 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008 (pp. 729-732). Piscataway: IEEE Computer Society Press. https://doi.org/10.1109/NEMS.2008.4484432
Berenschot, Johan W. ; Tas, Niels Roelof ; Jansen, Henricus V. ; Elwenspoek, Michael Curt. / 3D-Nanomachining using corner lithography. 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008. Piscataway : IEEE Computer Society Press, 2008. pp. 729-732
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Berenschot, JW, Tas, NR, Jansen, HV & Elwenspoek, MC 2008, 3D-Nanomachining using corner lithography. in 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008. IEEE Computer Society Press, Piscataway, pp. 729-732, 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008, Sanya, China, 6/01/08. https://doi.org/10.1109/NEMS.2008.4484432

3D-Nanomachining using corner lithography. / Berenschot, Johan W.; Tas, Niels Roelof; Jansen, Henricus V.; Elwenspoek, Michael Curt.

3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008. Piscataway : IEEE Computer Society Press, 2008. p. 729-732.

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

TY - GEN

T1 - 3D-Nanomachining using corner lithography

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N2 - We present a fabrication method to create 3D nano structures without the need for nano lithography. The method, named "corner lithography" is based on conformal deposition and subsequent isotropic thinning of a thin film. The material that remains in sharp concave corners is either used as a mask or directly as structural material. The method is demonstrated for nano scale modifications of pyramidal tips, as well as the creation of suspended nanowires.

AB - We present a fabrication method to create 3D nano structures without the need for nano lithography. The method, named "corner lithography" is based on conformal deposition and subsequent isotropic thinning of a thin film. The material that remains in sharp concave corners is either used as a mask or directly as structural material. The method is demonstrated for nano scale modifications of pyramidal tips, as well as the creation of suspended nanowires.

KW - IR-65148

KW - EWI-14246

KW - METIS-254923

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Berenschot JW, Tas NR, Jansen HV, Elwenspoek MC. 3D-Nanomachining using corner lithography. In 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008. Piscataway: IEEE Computer Society Press. 2008. p. 729-732 https://doi.org/10.1109/NEMS.2008.4484432