3D-Nanomachining using corner lithography

Johan W. Berenschot; Niels Roelof Tas; Henricus V. Jansen; Michael Curt Elwenspoek

doi:10.1109/NEMS.2008.4484432

3D-Nanomachining using corner lithography

Johan W. Berenschot, Niels Roelof Tas, Henricus V. Jansen, Michael Curt Elwenspoek

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

28 Citations (Scopus)

223 Downloads (Pure)

Abstract

We present a fabrication method to create 3D nano structures without the need for nano lithography. The method, named "corner lithography" is based on conformal deposition and subsequent isotropic thinning of a thin film. The material that remains in sharp concave corners is either used as a mask or directly as structural material. The method is demonstrated for nano scale modifications of pyramidal tips, as well as the creation of suspended nanowires.

Original language	English
Title of host publication	3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008
Place of Publication	Piscataway
Publisher	IEEE
Pages	729-732
Number of pages	4
ISBN (Print)	978-1-4244-1907-4
DOIs	https://doi.org/10.1109/NEMS.2008.4484432
Publication status	Published - 6 Jan 2008
Event	3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008 - Resort Horizon Sanya, Sanya, China Duration: 6 Jan 2008 → 9 Jan 2008 Conference number: 3

Publication series

Name
Publisher	IEEE Computer Society Press
Number	WoTUG-31

Conference

Conference	3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008
Abbreviated title	NEMS
Country/Territory	China
City	Sanya
Period	6/01/08 → 9/01/08

Keywords

IR-65148
EWI-14246
METIS-254923

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

Access to Document

10.1109/NEMS.2008.4484432

PIEEENMEMS_3_729

Cite this

@inproceedings{c577342bc40b4441813b87fd6351a966,

title = "3D-Nanomachining using corner lithography",

abstract = "We present a fabrication method to create 3D nano structures without the need for nano lithography. The method, named {"}corner lithography{"} is based on conformal deposition and subsequent isotropic thinning of a thin film. The material that remains in sharp concave corners is either used as a mask or directly as structural material. The method is demonstrated for nano scale modifications of pyramidal tips, as well as the creation of suspended nanowires.",

keywords = "IR-65148, EWI-14246, METIS-254923",

author = "Berenschot, {Johan W.} and Tas, {Niels Roelof} and Jansen, {Henricus V.} and Elwenspoek, {Michael Curt}",

year = "2008",

month = jan,

day = "6",

doi = "10.1109/NEMS.2008.4484432",

language = "English",

isbn = "978-1-4244-1907-4",

publisher = "IEEE",

number = "WoTUG-31",

pages = "729--732",

booktitle = "3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008",

address = "United States",

note = "3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008, NEMS ; Conference date: 06-01-2008 Through 09-01-2008",

}

Berenschot, JW , Tas, NR, Jansen, HV & Elwenspoek, MC 2008, 3D-Nanomachining using corner lithography. in 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008. IEEE, Piscataway, pp. 729-732, 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008, Sanya, China, 6/01/08. https://doi.org/10.1109/NEMS.2008.4484432

TY - GEN

T1 - 3D-Nanomachining using corner lithography

AU - Berenschot, Johan W.

AU - Tas, Niels Roelof

AU - Jansen, Henricus V.

AU - Elwenspoek, Michael Curt

N1 - Conference code: 3

PY - 2008/1/6

Y1 - 2008/1/6

N2 - We present a fabrication method to create 3D nano structures without the need for nano lithography. The method, named "corner lithography" is based on conformal deposition and subsequent isotropic thinning of a thin film. The material that remains in sharp concave corners is either used as a mask or directly as structural material. The method is demonstrated for nano scale modifications of pyramidal tips, as well as the creation of suspended nanowires.

AB - We present a fabrication method to create 3D nano structures without the need for nano lithography. The method, named "corner lithography" is based on conformal deposition and subsequent isotropic thinning of a thin film. The material that remains in sharp concave corners is either used as a mask or directly as structural material. The method is demonstrated for nano scale modifications of pyramidal tips, as well as the creation of suspended nanowires.

KW - IR-65148

KW - EWI-14246

KW - METIS-254923

U2 - 10.1109/NEMS.2008.4484432

DO - 10.1109/NEMS.2008.4484432

M3 - Conference contribution

SN - 978-1-4244-1907-4

SP - 729

EP - 732

BT - 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008

PB - IEEE

CY - Piscataway

T2 - 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2008

Y2 - 6 January 2008 through 9 January 2008

ER -

3D-Nanomachining using corner lithography

Abstract

Publication series

Conference

Keywords

UN SDGs

Access to Document

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