3D ordered nanostructures fabricated by nanosphere lithography using an organometallic etch mask

X.Y. Ling; C. Acikgoz; In Yee Phang; Mark A. Hempenius; David Reinhoudt; Gyula J. Vancso; Jurriaan Huskens

doi:10.1039/c0nr00007h

3D ordered nanostructures fabricated by nanosphere lithography using an organometallic etch mask

X.Y. Ling
, C. Acikgoz
, In Yee Phang
, Mark A. Hempenius
, David Reinhoudt
, Gyula J. Vancso
, Jurriaan Huskens

Research output: Contribution to journal › Article › Academic › peer-review

Original language	English
Pages (from-to)	1455-1460
Number of pages	6
Journal	Nanoscale
Volume	2
DOIs	https://doi.org/10.1039/c0nr00007h
Publication status	Published - 2010

Keywords

METIS-268186

Access to Document

10.1039/c0nr00007h

Cite this

@article{96c068f2dd024fe194e6db0e1ecca21b,

title = "3D ordered nanostructures fabricated by nanosphere lithography using an organometallic etch mask",

keywords = "METIS-268186",

author = "X.Y. Ling and C. Acikgoz and Phang, \{In Yee\} and Hempenius, \{Mark A.\} and David Reinhoudt and Vancso, \{Gyula J.\} and Jurriaan Huskens",

year = "2010",

doi = "10.1039/c0nr00007h",

language = "English",

volume = "2",

pages = "1455--1460",

journal = "Nanoscale",

issn = "2040-3364",

publisher = "Royal Society of Chemistry",

}

TY - JOUR

T1 - 3D ordered nanostructures fabricated by nanosphere lithography using an organometallic etch mask

AU - Ling, X.Y.

AU - Acikgoz, C.

AU - Phang, In Yee

AU - Hempenius, Mark A.

AU - Reinhoudt, David

AU - Vancso, Gyula J.

AU - Huskens, Jurriaan

PY - 2010

Y1 - 2010

KW - METIS-268186

U2 - 10.1039/c0nr00007h

DO - 10.1039/c0nr00007h

M3 - Article

SN - 2040-3364

VL - 2

SP - 1455

EP - 1460

JO - Nanoscale

JF - Nanoscale

ER -