3d Self-Aligned Fabrication of Suspended Nanowires by Crystallographic Nanolithography

Erwin J.W. Berenschot; Yasser Pordeli; Lucas J. Kooijman; Yves L. Janssens; Roald M. Tiggelaar; Niels R. Tas

doi:10.1109/MEMS49605.2023.10052139

3d Self-Aligned Fabrication of Suspended Nanowires by Crystallographic Nanolithography

Erwin J.W. Berenschot
, Yasser Pordeli
, Lucas J. Kooijman
, Yves L. Janssens
, Roald M. Tiggelaar
, Niels R. Tas^*

^*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

177 Downloads (Pure)

Abstract

Known templating procedures mostly create out-of-plane nanowires where individual connections at both ends are complicated. Here we introduce a templating procedure for wafer scale fabrication of in-plane nanowires. The template fabrication process employs two simple interference lithography masking patterns and relies on self-aligned crystallographic processing. In-plane nanowires with diameters down to 10 nm can be fabricated wafer scale through this 3D templating procedure. As a first demonstration arrays of suspended silicon nitride wires have been created.

Original language	English
Title of host publication	2023 IEEE 36th International Conference on Micro Electro Mechanical Systems, MEMS 2023
Publisher	IEEE
Pages	639-642
Number of pages	4
ISBN (Electronic)	9781665493086
DOIs	https://doi.org/10.1109/MEMS49605.2023.10052139
Publication status	Published - 1 Mar 2023
Event	36th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2023 - Munich, Germany Duration: 15 Jan 2023 → 19 Jan 2023 Conference number: 36

Publication series

Name	Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
Volume	2023-January
ISSN (Print)	1084-6999

Conference

Conference	36th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2023
Abbreviated title	MEMS 2023
Country/Territory	Germany
City	Munich
Period	15/01/23 → 19/01/23

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Keywords

3D
Corner lithography
nanowires
silicon crystal
templating
2023 OA procedure

Access to Document

10.1109/MEMS49605.2023.10052139

3d_Self-Aligned_Fabrication_of_Suspended_Nanowires_by_Crystallographic_NanolithographyFinal published version, 1.84 MBLicence: Taverne

Cite this

Berenschot, E. J. W., Pordeli, Y., Kooijman, L. J., Janssens, Y. L., Tiggelaar, R. M., & Tas, N. R. (2023). 3d Self-Aligned Fabrication of Suspended Nanowires by Crystallographic Nanolithography. In 2023 IEEE 36th International Conference on Micro Electro Mechanical Systems, MEMS 2023 (pp. 639-642). (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS); Vol. 2023-January). IEEE. https://doi.org/10.1109/MEMS49605.2023.10052139

@inproceedings{185d71647c2240fd943ac675a4260c86,

title = "3d Self-Aligned Fabrication of Suspended Nanowires by Crystallographic Nanolithography",

abstract = "Known templating procedures mostly create out-of-plane nanowires where individual connections at both ends are complicated. Here we introduce a templating procedure for wafer scale fabrication of in-plane nanowires. The template fabrication process employs two simple interference lithography masking patterns and relies on self-aligned crystallographic processing. In-plane nanowires with diameters down to 10 nm can be fabricated wafer scale through this 3D templating procedure. As a first demonstration arrays of suspended silicon nitride wires have been created.",

keywords = "3D, Corner lithography, nanowires, silicon crystal, templating, 2023 OA procedure",

author = "Berenschot, \{Erwin J.W.\} and Yasser Pordeli and Kooijman, \{Lucas J.\} and Janssens, \{Yves L.\} and Tiggelaar, \{Roald M.\} and Tas, \{Niels R.\}",

note = "Publisher Copyright: {\textcopyright} 2023 IEEE.; 36th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2023, MEMS 2023 ; Conference date: 15-01-2023 Through 19-01-2023",

year = "2023",

month = mar,

day = "1",

doi = "10.1109/MEMS49605.2023.10052139",

language = "English",

series = "Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)",

publisher = "IEEE",

pages = "639--642",

booktitle = "2023 IEEE 36th International Conference on Micro Electro Mechanical Systems, MEMS 2023",

address = "United States",

}

Berenschot, EJW, Pordeli, Y, Kooijman, LJ, Janssens, YL, Tiggelaar, RM & Tas, NR 2023, 3d Self-Aligned Fabrication of Suspended Nanowires by Crystallographic Nanolithography. in 2023 IEEE 36th International Conference on Micro Electro Mechanical Systems, MEMS 2023. Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS), vol. 2023-January, IEEE, pp. 639-642, 36th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2023, Munich, Germany, 15/01/23. https://doi.org/10.1109/MEMS49605.2023.10052139

3d Self-Aligned Fabrication of Suspended Nanowires by Crystallographic Nanolithography. / Berenschot, Erwin J.W.; Pordeli, Yasser; Kooijman, Lucas J. et al.
2023 IEEE 36th International Conference on Micro Electro Mechanical Systems, MEMS 2023. IEEE, 2023. p. 639-642 (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS); Vol. 2023-January).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - 3d Self-Aligned Fabrication of Suspended Nanowires by Crystallographic Nanolithography

AU - Berenschot, Erwin J.W.

AU - Pordeli, Yasser

AU - Kooijman, Lucas J.

AU - Janssens, Yves L.

AU - Tiggelaar, Roald M.

AU - Tas, Niels R.

N1 - Conference code: 36

PY - 2023/3/1

Y1 - 2023/3/1

N2 - Known templating procedures mostly create out-of-plane nanowires where individual connections at both ends are complicated. Here we introduce a templating procedure for wafer scale fabrication of in-plane nanowires. The template fabrication process employs two simple interference lithography masking patterns and relies on self-aligned crystallographic processing. In-plane nanowires with diameters down to 10 nm can be fabricated wafer scale through this 3D templating procedure. As a first demonstration arrays of suspended silicon nitride wires have been created.

AB - Known templating procedures mostly create out-of-plane nanowires where individual connections at both ends are complicated. Here we introduce a templating procedure for wafer scale fabrication of in-plane nanowires. The template fabrication process employs two simple interference lithography masking patterns and relies on self-aligned crystallographic processing. In-plane nanowires with diameters down to 10 nm can be fabricated wafer scale through this 3D templating procedure. As a first demonstration arrays of suspended silicon nitride wires have been created.

KW - 3D

KW - Corner lithography

KW - nanowires

KW - silicon crystal

KW - templating

KW - 2023 OA procedure

UR - https://www.scopus.com/pages/publications/85149819936

U2 - 10.1109/MEMS49605.2023.10052139

DO - 10.1109/MEMS49605.2023.10052139

M3 - Conference contribution

AN - SCOPUS:85149819936

T3 - Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

SP - 639

EP - 642

BT - 2023 IEEE 36th International Conference on Micro Electro Mechanical Systems, MEMS 2023

PB - IEEE

T2 - 36th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2023

Y2 - 15 January 2023 through 19 January 2023

ER -

Berenschot EJW, Pordeli Y, Kooijman LJ, Janssens YL, Tiggelaar RM , Tas NR. 3d Self-Aligned Fabrication of Suspended Nanowires by Crystallographic Nanolithography. In 2023 IEEE 36th International Conference on Micro Electro Mechanical Systems, MEMS 2023. IEEE. 2023. p. 639-642. (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)). doi: 10.1109/MEMS49605.2023.10052139

3d Self-Aligned Fabrication of Suspended Nanowires by Crystallographic Nanolithography

Abstract

Publication series

Conference

UN SDGs

Keywords

Access to Document

Other files and links

Fingerprint

Cite this