Abstract
• From oxide-only silicon fractal processing [1]: realization of 3D template for various applications. In this case, photodiodes have been made.
• Electrical connections formed by adopting top protection method with silicon oxide and silicon nitride
• Concave [2] and Convex [3] Corner Lithography: corners can be selectively opened or protected with nano size precision without extra lithography steps. This example: convex corners in the latest generation are opened for <20 nm while other corners are protected.
• ALD as perfect candidate for conformal metal deposition in 3D structures. In this case, 7 nm molybdenum [4] has been deposited.
• Electrical connections formed by adopting top protection method with silicon oxide and silicon nitride
• Concave [2] and Convex [3] Corner Lithography: corners can be selectively opened or protected with nano size precision without extra lithography steps. This example: convex corners in the latest generation are opened for <20 nm while other corners are protected.
• ALD as perfect candidate for conformal metal deposition in 3D structures. In this case, 7 nm molybdenum [4] has been deposited.
| Original language | English |
|---|---|
| Number of pages | 2 |
| Publication status | Published - 2024 |
| Event | MESA+ Meeting 2024 - Kinepolis, Enschede, Netherlands Duration: 23 Sept 2024 → 23 Sept 2024 https://www.utwente.nl/en/mesaplus/events/2024/9/1460310/mesa-meeting-2024 |
Conference
| Conference | MESA+ Meeting 2024 |
|---|---|
| Country/Territory | Netherlands |
| City | Enschede |
| Period | 23/09/24 → 23/09/24 |
| Internet address |
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