A compact refractometric sensor based on grated silicon photonic wires

L.J. Kauppinen, Hugo Hoekstra, R.M. de Ridder

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    6 Citations (Scopus)


    Grated silicon photonic wires for refractometric applications have been fabricated using a 248-nm deep UV lithography. It is shown experimentally, that a device with length of only 180m has an index sensitivity of $10^{-6}$ assuming a detector power resolution of 1%. It is also demonstrated that the device is suitable to monitor index changes in a liquid cladding, which could be used to monitor on chip chemical reactions.
    Original languageUndefined
    Article number10.1016/j.snb.2008.12.023
    Pages (from-to)194-198
    Number of pages5
    JournalSensors and Actuators B: Chemical
    Issue number1
    Publication statusPublished - 20 May 2009


    • Grating
    • Silicon
    • Sensor
    • IR-62805
    • photonic wire
    • EWI-15342
    • METIS-263842
    • Waveguide

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