Abstract
Grated silicon photonic wires for refractometric applications have been fabricated using a 248-nm deep UV lithography. It is shown experimentally, that a device with length of only 180m has an index sensitivity of $10^{-6}$ assuming a detector power resolution of 1%. It is also demonstrated that the device is suitable to monitor index changes in a liquid cladding, which could be used to monitor on chip chemical reactions.
Original language | Undefined |
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Article number | 10.1016/j.snb.2008.12.023 |
Pages (from-to) | 194-198 |
Number of pages | 5 |
Journal | Sensors and actuators. B: Chemical |
Volume | 139 |
Issue number | 1 |
DOIs | |
Publication status | Published - 20 May 2009 |
Keywords
- IOMS-SNS: SENSORS
- Grating
- Silicon
- Sensor
- IR-62805
- photonic wire
- EWI-15342
- METIS-263842
- Waveguide