A correlation-based fingerprint verification system

Asker M. Bazen, Gerben T.B. Verwaaijen, Sabih H. Gerez, Leo P.J. Veelenturf, Berend Jan van der Zwaag

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    Abstract

    In this paper, a correlation-based fingerprint verification system is presented. Unlike the traditional minutiae-based systems, this system directly uses the richer gray-scale information of the fingerprints. The correlation-based fingerprint verification system first selects appropriate templates in the primary fingerprint, uses template matching to locate them in the secondary print, and compares the template positions of both fingerprints. Unlike minutiae-based systems, the correlation-based fingerprint verification system is capable of dealing with bad-quality images from which no minutiae can be extracted reliably and with fingerprints that suffer from non-uniform shape distortions. Experiments have shown that the performance of this system at the moment is comparable to the performance of many other fingerprint verification systems.
    Original languageEnglish
    Title of host publicationProceedings SAFE, ProRISC, SeSens 2000
    Subtitle of host publicationNovember 29-December 1, 2000, Veldhoven, the Netherlands
    Place of PublicationNetherlands
    PublisherSTW
    Pages205-213
    Number of pages9
    ISBN (Print)90-73461-24-3
    Publication statusPublished - Nov 2000
    Event11th Annual Workshop on Circuits, Systems and Signal Processing, ProRISC 2000 - Veldhoven, Netherlands
    Duration: 30 Nov 20001 Dec 2000

    Workshop

    Workshop11th Annual Workshop on Circuits, Systems and Signal Processing, ProRISC 2000
    CountryNetherlands
    CityVeldhoven
    Period30/11/001/12/00

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    Keywords

    • Fingerprint verification
    • METIS-114152
    • IR-17257
    • Image Processing
    • SCS-Safety
    • Template matching
    • EWI-1776

    Cite this

    Bazen, A. M., Verwaaijen, G. T. B., Gerez, S. H., Veelenturf, L. P. J., & van der Zwaag, B. J. (2000). A correlation-based fingerprint verification system. In Proceedings SAFE, ProRISC, SeSens 2000: November 29-December 1, 2000, Veldhoven, the Netherlands (pp. 205-213). Netherlands: STW.