Abstract
We recently built an Inductively-Coupled Remote Plasma-Enhanced Chemical Vapor Deposition (ICPECVD) system for deposition of dielectric and semi-conducting layers at low substrate temperatures (~150
Original language | English |
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Title of host publication | Proceedings of 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors 2005 |
Place of Publication | Veldhoven, The Netherlands |
Publisher | STW |
Pages | 67-69 |
Number of pages | 3 |
ISBN (Print) | 90-73461-50-2 |
Publication status | Published - 17 Nov 2005 |
Event | 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2005 - Veldhoven, Netherlands Duration: 17 Nov 2005 → 18 Nov 2005 Conference number: 8 |
Workshop
Workshop | 8th Annual Workshop on Semiconductor Advances for Future Electronics and Sensors, SAFE 2005 |
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Abbreviated title | SAFE |
Country/Territory | Netherlands |
City | Veldhoven |
Period | 17/11/05 → 18/11/05 |
Keywords
- Thin film
- SC-CICC: Characterization of IC Components
- high-density plasma
- PECVD
- ICRPECVD
- ICPECVD
- ALD
- CVD