Abstract
The growing demand from industry for high-precision systems introduces new challenges for positioning mechanisms. High accuracy and repeatability down
to the sub-micron scale are not uncommon. This is often combined with extreme environments, like high UV light sources, electron beams or vacuum. This
article focuses on the flexure mechanism for a largestroke planar XY-positioning system. Applications for such a flexure mechanism can be found in for example lithography, micromachining or microscopy.
Original language | English |
---|---|
Pages (from-to) | 12-17 |
Journal | Mikroniek |
Volume | 51 |
Issue number | 6 |
Publication status | Published - 2011 |