A large-stroke planar 2-DOF flexure-based positioning stage for vacuum environments

Ger Folkersma, Steven Boer, Dannis Michel Brouwer, Justus Laurens Herder

Research output: Contribution to journalArticleAcademic

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Abstract

The growing demand from industry for high-precision systems introduces new challenges for positioning mechanisms. High accuracy and repeatability down to the sub-micron scale are not uncommon. This is often combined with extreme environments, like high UV light sources, electron beams or vacuum. This article focuses on the flexure mechanism for a largestroke planar XY-positioning system. Applications for such a flexure mechanism can be found in for example lithography, micromachining or microscopy.
Original languageEnglish
Pages (from-to)12-17
JournalMikroniek
Volume51
Issue number6
Publication statusPublished - 2011

Keywords

  • IR-89562
  • METIS-302787

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