A long pulse discharge excited ArF Laser

L. Feenstra, Hubertus M.J. Bastiaens, P.J.M. Peters, W.J. Witteman

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Abstract

An X-ray preionised, discharge excited ArF excimer laser, λ=193 nm, has been studied in the long pulse regime. The laser performance is found to be primarily dependent on the discharge stability, and therefore, on the gas composition, preionization timing and the pumping power. Using X-ray preionization and prepulse-mainpulse excitation, laser pulselengths of up to 120-ns full-width at half-maximum at 4 mJ/l are obtained by decreasing the partial pressures of the active ingredients, F2 and Ar, and using Ne as a buffer gas. This is almost six times as long as usual for discharge excited ArF lasers.
Original languageUndefined
Pages (from-to)1515-1521
Number of pages7
JournalIEEE journal of selected topics in quantum electronics
Volume05
Issue number06
DOIs
Publication statusPublished - 1999

Keywords

  • METIS-128495
  • IR-23696

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